Single crystal-like Si patterns for photonic crystal color filters

Cho, Eun Hyoung; Kim, Hae Sung; Sohn, Jin Seung; Moon, Chang Youl; Park, No Cheol; Park, Young Pil

doi:10.1088/0957-4484/22/13/135301

Cited by 2 publications

(2 citation statements)

References 10 publications

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“…Finally, manufacturing of Si can rely on well-established and cost-efficient processes from CMOS technology. These properties of Si nanostructures have already been used successfully for color elements or antireflection coatings in linear grating, − two-dimensional array, − and thin-film configurations. Additionally, Si cylinders and optimized polarization sensitive designs have recently been exploited for the specific purpose of reproducing discrete color palettes using isolated elements observed in dark field illumination.…”

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confidence: 99%

Silicon Nanostructures for Bright Field Full Color Prints

et al. 2017

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Nanoscale color printing has recently emerged as a unique alternative to traditional pigments by providing record spatial resolution, angular independent, durable and single material colors. Widely based on plasmonic nanostructures, numerous efforts in the field have aimed at extending color range and saturation relying on a variety of designs and metals. Alternatively, silicon nanostructures support finely tunable electric and magnetic multipolar resonances, afford low absorption losses and benefit from well-established industrial fabrication processes, all features ideally suited to nanoscale color printing. Here we compare the properties of silicon nanodiscs with those of aluminum and silver plasmonic elements for the specific purpose of nanoscale color reproduction targeting the coverage of a broad and vivid color palette. We highlight the different properties of such metallic and dielectric resonators in various geometric and illumination conditions leading to the optimization of silicon nanodisc arrays for the fabrication of high resolution color features as well as millimetric paining replicas. The fabricated structures span a large, continuous color range with varying hue and saturation that is visible by conventional optical microscopy, photography as well as the bare eye under white light illumination. High-throughput electron beam lithography as well as color mixing schemes are discussed to further harness the unique properties of silicon nanodiscs as color elements, paving the way for a broader exploitation of nanoscale color printing.

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confidence: 99%

Silicon Nanostructures for Bright Field Full Color Prints

et al. 2017

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“…Optical narrowband filters are desirable in optical measurement devices, display, and imaging devices [1][2][3]. Conventional dielectric structures, including diffraction optic devices [4], photonic crystals [5][6][7][8], and periodic gratings [9][10][11],…”

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confidence: 99%

Monochromatic filter with multiple manipulation approaches by the layered all-dielectric patch array

Liu

et al. 2016

Nanotechnology

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Monochromatic filtering with ultra-narrowband and high spectral contrast is desirable for wide applications in display, image, and other optoelectronics. However, owing to the inherent omhic losses in the metallic materials, a broadband spectrum with a low Q-factor down to 10 inevitably limits the device performance. Herein, we for the first time theoretically propose and demonstrate an ultra-narrowband color-filtering platform based on the layered all-dielectric meta-material (LADM), which consists of a triple-layer high/low/high-index dielectrics cavity structure. Owing to the lossless dielectric materials used, sharp resonances with the bandwidth down to sub-10 nm are observed in the sub-wavelength LADM-based filters. A spectral Q-factor of 361.6 is achieved, which is orders of magnitude larger than that of the plasmonic resonators. Moreover, for the other significant factor for evaluation of filtering performance, the spectral contrast reaches 94.5%. These optical properties are the main results of the excitation of the resonant modes in the LADMs. Furthermore, polarization-manipulated light filtering is realized in this LADM. The classical Malus law is also confirmed in the reflective spectrum by tuning the polarization state. More interestingly and importantly, the filtering phenomenon shows novel features of the wavelength-independent and tunable resonant intensity for the reflective spectrum when the LADM-based filter is illuminated under an oblique state. High scalability of the sharp reflective spectrum is obtained by tuning the structural parameters. A single-wavelength reflective filtering window is also achieved in the visible frequencies. These features hold promise for the LADM-based filter with wide applications in color engineering, displaying, imaging, etc.

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Single crystal-like Si patterns for photonic crystal color filters

Cited by 2 publications

References 10 publications

Silicon Nanostructures for Bright Field Full Color Prints

Silicon Nanostructures for Bright Field Full Color Prints

Monochromatic filter with multiple manipulation approaches by the layered all-dielectric patch array

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