2014
DOI: 10.1116/1.4874618
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Single-crystalline silver film grown on Si (100) substrate by using electron-gun evaporation and thermal treatment

Abstract: The authors demonstrate a simple method to fabricate ultrasmooth single-crystalline silver (Ag) films with high reflectivity and low plasmonic damping. The single-crystalline Ag thin film on the clean Si (100) substrate is first deposited by electron-gun evaporator and then treated by rapid thermal annealing (RTA) to improve its quality. The crystal structure and surface morphology are characterized by x-ray diffraction, transmission electron microscopy, and atomic force microscopy. Optical constants of the pr… Show more

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Cited by 11 publications
(12 citation statements)
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“…We placed ZnO nanowires on the single-crystalline Ag film [25] with 7 nm thick and 12 nm thick SiO 2 spacer layers, respectively. Because the wavelength corresponds to the plasma frequency of the bulk Ag is 138 nm, Ag is the material typically used in the visible and near-infrared regimes.…”
Section: Methodsmentioning
confidence: 99%
See 3 more Smart Citations
“…We placed ZnO nanowires on the single-crystalline Ag film [25] with 7 nm thick and 12 nm thick SiO 2 spacer layers, respectively. Because the wavelength corresponds to the plasma frequency of the bulk Ag is 138 nm, Ag is the material typically used in the visible and near-infrared regimes.…”
Section: Methodsmentioning
confidence: 99%
“…Before loading the silicon substrate into the E-gun evaporator chamber, a standard RCA cleaning process (along with dipping in the HF:H 2 O [1:100] solution) was performed to remove the oxidation layer. The 200 nm thick Ag thin film was evaporated on the (100) intrinsic silicon substrate under a 1×10 −6 Torr environment, and was then annealed at 340°C for 60 s in the nitrogen-flowing environment to flatten the surface roughness and rearrange the Ag atoms to form an atomically flat, single-crystalline metal film [25]. According to this procedure, the root-mean-square (RMS) roughness of the Ag film could be as low as about 0.5 nm.…”
Section: A Device Fabricationmentioning
confidence: 99%
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“…This SiN x layer has two major functions: one is served as the a current-blocking layer to prevent the leakage current, and the other is served as a part of optical waveguide shell to reduce the optical field leak to the silver, which would result in a serious metal absorption loss [23]. The silver can provide several functionalities in the nanolaser, including the cavity boundary for optical mode confinement [24], shielding from crosstalk among lasers, the electrical contacts and, more importantly, an efficient heat sink.…”
Section: Design and Optimization Of Metallic Nanolaser Structuresmentioning
confidence: 99%