2009
DOI: 10.1088/0957-4484/20/43/434012
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Single site-controlled In(Ga)As/GaAs quantum dots: growth, properties and device integration

Abstract: Results obtained by an advanced growth of site-controlled quantum dots (SCQDs) on pre-patterned nanoholes and their integration into both photonic resonators and nanoelectronic memories are summarized. A specific technique has been pursued to improve the optical quality of single SCQDs. Quantum dot (QD) layers have been vertically stacked but spectrally detuned for single SCQD studies. Thereby, the average emission linewidth of single QDs could be reduced from 2.3 meV for SCQDs in a first QD layer close to the… Show more

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Cited by 84 publications
(79 citation statements)
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“…A detailed description of the fabrication techniques is given in Ref. 34. Short circuiting the drain contact with lateral gates provides the memristive operation.…”
Section: (A)mentioning
confidence: 99%
“…A detailed description of the fabrication techniques is given in Ref. 34. Short circuiting the drain contact with lateral gates provides the memristive operation.…”
Section: (A)mentioning
confidence: 99%
“…The PCA technique was applied to all layers except the topmost in order to accomplish a spectral detuning between the different layers to facilitate single SCQD studies. The samples were investigated by optical spectroscopy in order to assess the effect of a stacked growth of QDs on their emission linewidths 20 . In addition, it was studied whether dry or wet chemical leads to better optical quality of the SCQDs.…”
Section: Growth Of Site Controlled Qds On Prepatterned Substratesmentioning
confidence: 99%
“…5 to the calculated LDOS we have extracted the decay rates Γ 0.90 0.20 and Γ 0.99 0. 20 . Taking Eqs.…”
Section: Quantum Efficiency and Oscillator Strength Of Site Controllementioning
confidence: 99%
“…At first nucleation centres are defined on a planar GaAs surface by means of e-beam lithography and etching. After thoroughly removing resists and oxides [38] regrowth on the patterned surface is performed, initialized by a thin GaAs buffer layer to smooth the surface and subsequent deposition of InAs QDs in single layers or stacked QD layers at low growth rates. This technique allowed us to direct the nucleation of the InAs QDs to a high degree as shown in scanning electron microscopy images on uncapped QDs in Fig.…”
Section: Quantum Dot Growthmentioning
confidence: 99%