Finding proper strategies to control plasma polymerization processes is a crucial aspect to produce thin films with tailored characteristics. In this work, the validity of the Yasuda parameter W/FM (W: discharge power and FM: precursor feed rate) as a controlling parameter for a polymerization process assisted by an atmospheric pressure single electrode plasma jet and the aerosolized fluorinated silane precursor trimethoxy (3,3,3-trifluoropropyl) silane is demonstrated. The properties of thin films deposited under different W/FM values are discussed using attenuated total reflectance-Fourier transform infrared (ATR-FTIR) spectroscopy, X-ray photoelectron spectroscopy (XPS), water contact angle (WCA) measurements, and scanning electron microscopy (SEM). Results suggest the presence of two deposition domains as a function of W/FM (an energy-deficient domain and a monomer-deficient domain), each inducing coatings with different chemical and physical properties. Furthermore, coatings deposited under the same W/FM values exhibit similar characteristics regardless of the power and feed rate values