2021
DOI: 10.1088/1361-6641/abed8d
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Single-trap emission kinetics of vertical β-Ga2O3 Schottky diodes by deep-level transient spectroscopy

Abstract: We report the emission kinetics of a single-electron trap (E1, E C–0.63 eV) in Sn-doped ( 2 ˉ 01) β-Ga2O3 crystals studied using deeplevel transient spectroscopy (DLTS). The time constant ( τ … Show more

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Cited by 11 publications
(4 citation statements)
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“…2(d) illustrates apparent trap concentration (N Ta ) profile versus depletion region width (W R ) at 315 K, obtained from the isothermal ODLTS results for scaning U R . W R was determined from C-V characteristics at 315 K by the relation [34] :…”
Section: Resultsmentioning
confidence: 99%
“…2(d) illustrates apparent trap concentration (N Ta ) profile versus depletion region width (W R ) at 315 K, obtained from the isothermal ODLTS results for scaning U R . W R was determined from C-V characteristics at 315 K by the relation [34] :…”
Section: Resultsmentioning
confidence: 99%
“…As shown in figure 3(c), the T-dependent relationship can be fitted by Arrhenius relation, which is expressed as following equation [4]:…”
Section: Trap Characteristicsmentioning
confidence: 99%
“…(4.9 eV), high critical electric field of 8 MV cm −1 , and excellent thermal stability [1][2][3]. In addition to β-Ga 2 O 3 devices based on bulk semiconducting materials [4,5], there have been ample efforts devoted to development of β-Ga 2 O 3 epitaxial layers and devices [6][7][8][9][10]. High-quality β-Ga 2 O 3 homogeneous epilayers with low effective donor concentration have been grown and demonstrated by hydride vapor phase epitaxy (HVPE) [10].…”
Section: Introductionmentioning
confidence: 99%
“…of single-crystal native substrates [1,2]. In the past, in addition to unipolar devices [3][4][5], enormous efforts have been made in the development of β-Ga 2 O 3 -based bipolar devices [6][7][8][9]. However, p-type β-Ga 2 O 3 represents a challenge due to its large hole effective mass and self-trapping of holes in β-Ga 2 O 3 [2,10].…”
Section: Introductionmentioning
confidence: 99%