2020
DOI: 10.1002/ppap.202000143
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Site‐selective atmospheric pressure plasma‐enhanced chemical vapor deposition process for micrometric deposition of plasma‐polymerized methyl methacrylate

Abstract: An atmospheric pressure plasma chemical vapor deposition process designed for the site‐selective deposition of organic functional materials with a sub‐millimetric lateral resolution is presented in this study. Injecting methyl methacrylate vapor in plasma post‐discharge allowed to synthesize plasma‐polymerized methyl methacrylate (ppMMA) coatings on metallic, dielectric, and polymer substrates at close to room temperature (40°C). A circular dot, as small as 400 µm in diameter, of ppMMA is deposited and charact… Show more

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Cited by 5 publications
(7 citation statements)
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“…The estimation of the post-discharge gas temperature was done by measuring the rotational temperature of OH ( λ = 306 to λ = 310 nm) from the OES data. 45 This temperature is competitively lower than the current lowest temperature of graphene synthesis (>250 °C) 46 achieved using atmospheric pressure microwave plasma. 47,48 Therefore, we estimate the great perspective of this process as it opens a new horizon in low-temperature single-step preparation of metal-oxide@graphene-based nanocomposites.…”
Section: Resultsmentioning
confidence: 88%
“…The estimation of the post-discharge gas temperature was done by measuring the rotational temperature of OH ( λ = 306 to λ = 310 nm) from the OES data. 45 This temperature is competitively lower than the current lowest temperature of graphene synthesis (>250 °C) 46 achieved using atmospheric pressure microwave plasma. 47,48 Therefore, we estimate the great perspective of this process as it opens a new horizon in low-temperature single-step preparation of metal-oxide@graphene-based nanocomposites.…”
Section: Resultsmentioning
confidence: 88%
“…As reported in a previous paper [10], the micro-deposition was obtained by carefully setting the two different gas flows: [Ar + MMA] in the central capillary and [Ar] in the plasma discharge tube. Getting a circular plasma polymerised MMA dot requires a very sharp tuning of the different gas flows.…”
Section: Deposition Regimesmentioning
confidence: 99%
“…To perform a CVD process, a precursor has to be introduced into the area with reactive species. This can be done in two sections: into the plasma discharge [9] or into the 'post-discharge' region [10,11], which is the region downstream after the plasma discharge where only reactive neutral species are present (no electrons neither ions) [12][13][14]. Injection into the plasma discharge offers higher reactivity as it can directly utilize the high-energy electrons.…”
Section: Introductionmentioning
confidence: 99%
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