2007
DOI: 10.1021/la7011292
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Site-Specific Functionalization on Individual Colloids:  Size Control, Stability, and Multilayers

Abstract: Individual colloidal particles are locally functionalized with nanoscale control. Here we use the particle lithography technique to mask one region of a silica or polystyrene particle (size 3.0 mum down to 170 nm), while the remaining 95% or more of the particle is coated with various sized nanocolloids. The images and data show precise and predictable control over the size of the region, with fine-tuned patch size control obtainable by changing the ionic strength of the solution. The coating on the particles … Show more

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Cited by 71 publications
(81 citation statements)
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References 31 publications
(52 reference statements)
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“…Besides the one-patch model particles presented here, a wide variety of synthetic routes for colloids with more complex patterns of rough and smooth surfaces is readily available in literature (28,(34)(35)(36)(37)(38)(39)(40). In particular, we emphasize that size, number and even the angle between patches can be controlled (38)(39)(40).…”
Section: Resultsmentioning
confidence: 99%
“…Besides the one-patch model particles presented here, a wide variety of synthetic routes for colloids with more complex patterns of rough and smooth surfaces is readily available in literature (28,(34)(35)(36)(37)(38)(39)(40). In particular, we emphasize that size, number and even the angle between patches can be controlled (38)(39)(40).…”
Section: Resultsmentioning
confidence: 99%
“…[10,11,70] Next, we will introduce evaporation-driven colloidal assembly, as pioneered by Manoharan et al (Figure 5b), [12,68] and particle lithography, as invented by Snyder et al (Figure 5c). [9,16] The commonality between these three techniques is that fabrication/assembly occurs Adapted with permission from ref. [27] Copyright 2007, Nature Publishing Group.…”
Section: Patchy Particle Fabrication Techniquesmentioning
confidence: 99%
“…[90] Figure 5c shows a schematic of the technique. [9] Since particle lithography is a LPD-based technique, a mask is needed to produce sitespecific functionalization. The essence of the method is that a charged particle adheres to an oppositely charged surface.…”
Section: Particle Lithographymentioning
confidence: 99%
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