deposition temperature (≈300 °C) limit their applications in large-area/flexible/ curved optoelectronic devices. Therefore, several candidates, including carbon nanotubes, [4,10] graphene, [11,12] conductive polymers, [13,14] and metal-network electrodes (MNEs) [15,16] were investigated to replace ITO films. Due to the relatively low electrical conductivity of large-scale graphene and high contact resistance of carbon nanotubes, the applications of these carbon-based nanomaterials are highly limited. And further on the poor conductivity and instability of conducting polymers, MNEs are a strong candidate due to their superior electrical and optical performance. [17][18][19] The solution-processed metal nanowires such as Ag NWs [20,21] and Cu NWs [22][23][24] are excellent materials to structure high-property electrodes by a coating process. [25] However, the contact resistance at the nanogap junctions between these nanowires results in much lower conductivity compared to the evaporated metal electrodes. Moreover, the poor adhesion [26] and protrusions [27] limit the applications of these solution-processed electrodes. The continuous metal nanowires could be fabricated by the using of a electrospun nonwoven masks [28][29][30][31][32] before the metal evaporation process and avoids the influence of contact resistance. But the disorderly arrangement of metal nanowires makes the inhomogeneity of film conductivity and results in the inferior quality of electrodes. Screen printing or inkjet printing can construct and arrange metal nanowires networks by using the metal precursor solution [33,34] or metal nanoparticle pastes, [35][36][37] but usually requiring a high temperature annealing (>200 °C) process. The high temperature heavily limits the selection of polymeric/elastomeric substrates. Therefore, in addition to transparency and resistance, low preparation temperature is very important in flexible MNEs.In this work, we reported highly transparent, ultrathin/ curved MNEs fabricated by programmable electrohydrodynamic (EHD) lithography, which directly generates high-resolution pattern of photoresist on ultrathin and curved substrates. The EHD lithography technique is a simple, data-driven, and inexpensive process, avoiding exposure or development process of conventional photolithography. [38] Moreover, it does not require high-temperature heat treatment and complicated transferring, Metal-network electrodes (MNEs) are excellent substitutes to the brittle and expensive indium tin oxide (ITO) films for flexible and transparent electronic devices. For a high transmittance and low resistivity, highly ordered metal wire arrays with suitable gap and width are essential. Here, high-orderly and dimension-controllable ultrathin/conformal MNEs are fabricated on µm thick/curved substrate via programmable electrohydrodynamic (EHD) lithography. By employing EHD direct-writing, large-scale high-resolution photoresist micro/nano-pattern can be digitally printed on ultrathin/curved substrates, as the digital mask in chemical etching ...