“…However, once the thickness is further reduced to less than a critical thickness, h cr , free-surface effects on micromechanisms of plasticity make the fracture toughness, K IC ðd; hÞ ¼ ffiffiffiffiffiffiffiffiffiffiffiffiffiffiffiffiffiffiffi EG c ðd; hÞ p , of nominally ductile metals decrease with the thickness [12,19,22,23], where E is Young's modulus. For example, Begley et al [24] noted that the fracture toughness increased from 6.9 to 8.5 MPa ffiffiffiffi m p for copper thin films when the thickness is increased from 200 to 600 nm, which is in agreement with experimental results by Hirakata et al [13], who measured K IC = 2.34, 6.63 and 7.81 MPa ffiffiffiffi m p for copper films of h ¼ 100; 500 and 800 nm, and d ¼ 170; 280 and 370 nm correspondingly in that order. Approaches adopted previously for the evaluation of the fracture toughness of thin films include notched tensile tests [12,13,19,22,25], channel cracking tests [24,26], bulge tests [27,28], scratch adhesive tests [29][30][31] and indentation tests [14,32,33].…”