thickness and the crystal structure are necessary requirements. [15,16] Epitaxial growth of magnetic thin films enables the precise control of strain and crystal orientation, both of which have critical effects on the magnetization of thin films. [17,18] Another important benefit of epitaxial growth is limiting the grain boundary diffusion, which is shown to play a critical role in interlayer diffusion of the multilayer ultrathin films. [19,20] In order to fully realize the benefits of the ultrathin magnetic films, they need to be grown in an epitaxial fashion with a fine-tuned crystal structure and orientation. This subject is explored in the present paper.Plasma-enhanced atomic layer deposition (PEALD) is a method for the deposition of Ni films that offers several advantages over more mainstream deposition methods, such as sputtering and chemical vapor deposition (CVD). These advantages include precise thickness control, relatively low growth temperature, and conformality, i.e., the ability to deposit a film with a uniform thickness over a non-flat substrate. [21][22][23] All of these benefits make this method suitable for growing ultrathin films, where thickness and structure are critical parameters. [24] The authors have previously reported the plasma-enhanced ALD growth and characterization of nickel thin films with quasi-epitaxial crystal structure. [25] As reported, increasing the deposition temperature resulted in improving the crystallinity of the films. At deposition temperature of 360 °C, chemically pure nickel films were deposited. Crystal structure analysis showed the films had a polycrystalline textured structure with a strong out-of-plane orientation relationship with the sapphire substrate. However, full epitaxial growth was not achieved. This issue has been addressed in this paper.Apart from the above-mentioned publication, there have been other recent reports on nickel deposition. Park et al. [26] recently reported on PEALD of nickel thin films using [Ni(dpdab) 2 ] and NH 3 plasma, with the films reportedly having a fcc polycrystalline structure. In a separate study, Suturin et al. [27] demonstrated the deposition of epitaxial nickel islands on CaF 2 at 600 °C, using an electron beam source. The isolated islands had fcc crystal structure and crystallographic orientations dictated by that of the substrate. On a related subject, Tarachand et al. [28] investigated phase structure and magnetism in nickel nanoparticles grown by thermal decomposition, and reported that the Ultrathin metal films have a wide variety of applications, especially in microelectronics. A key method to deposit these films is plasma-enhanced atomic layer deposition (PEALD), which is known for its ability to deposit thin films conformally and at relatively low temperatures. Building on the recent work, an improved recipe is reported on for the development of nickel PEALD technology, through which fully epitaxial nickel thin films are deposited. The effect of continuous heating on the phase structure and agglomeration in the met...