Size Shrinkage of Methacrylate-based Terpolymer Latexes Synthesized by Free Radical Polymerization: Kinetics and Influence of Main Reaction Parameters

Armini, Silvia; Whelan, Caroline M.; Smet, Mario; Eslava, Salvador; Maex, Karen

doi:10.1295/polymj.pj2005184

Cited by 14 publications

(23 citation statements)

References 20 publications

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“…The particle properties and compositions are summarized in Table I. 10 For the CMP experiments, 500 nm high-density plasma ͑HDP͒ oxide wafers on silicon were used as substrates. A total of 15 wafers were polished with 30 nm HC Stark Levasil 100 k/30% colloidal silica, 90 nm HC Stark Levasil 50 k/30% colloidal silica, or 350 nm polymer particles, composites A and B in water solutions at pH 10 on a rotary polisher ͑E 460 Mecapol polisher, Alpsitec͒.…”

Section: Methodsmentioning

confidence: 99%

Composite Polymer-Core Silica-Shell Abrasive Particles during Oxide CMP

Armini

Whelan

Maex

et al. 2007

J. Electrochem. Soc.

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Chemical mechanical planarization ͑CMP͒ is a triboelectrochemical process dominated by mechanical and chemical-assisted wear. The choice of abrasive used in this process is of fundamental importance. In this study, oxide CMP using novel polymer-core silica-shell composites were compared with conventional colloidal silica as abrasives in terms of removal rate and surface finishing. The composite particles were achieved by either creating chemical bonds by silane coupling agents or tuning the pH to form electrostatic attractive interactions between the core and the shell. We used oxide CMP as a convenient test vehicle for defectivity characterization and comparison between different abrasives. Due to the higher complexity of the composite abrasive with respect to the simple silica particle-wafer system, we combined different surface analysis techniques with methods of defect quantification and enhancement. Overall, fewer and shallower scratches were detected for the composites with respect to colloidal silica.

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Section: Methodsmentioning

confidence: 99%

Composite Polymer-Core Silica-Shell Abrasive Particles during Oxide CMP

Armini

Whelan

Maex

et al. 2007

J. Electrochem. Soc.

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“…The Poly Methyl Methacrylate (PMMA) ñ based terpolymer particles (diameter = 300 ± 16 nm) are synthesized following a procedure already described in previous published papers [11]. The polymer cores are coated by ceria particles by either creating chemical bonds by silane coupling agents (Composite A) [12] or tuning the final pH to 3 after mixing the two particle types in order to form electrostatic attractive interactions between the core and the shell (Composite B).…”

Section: Synthesis Of the Composite Polymer Core -Ceria @ Shell Partimentioning

confidence: 99%

Composite polymer core – ceria shell abrasive particles during silicon oxide CMP

et al. 2007

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Although dielectric polishing is primarily mechanical in nature, surface chemical effects can be tailored to enhance material removal, selectivity and planarity. The use of ceria abrasives in oxide polishing is particularly attractive because of favorable polishing characteristics that are generally not obtainable using conventional fumed or colloidal silica abrasives. Unfortunately, a characteristic of ceria abrasive is an enhanced tendency toward defectivity in comparison with conventional silica. Entirely novel composite structures comprising 300 nm polymer particles coated by ceria (specific surface area of the powder 61 m≤/g), are achieved by either adding silane coupling agents (Composite A) or tuning the pH in order to form electrostatic attractive interactions between the core and the shell (Composite B). The polymer core shows mechanical properties that are highly tunable by variation of its synthesis parameters, while the major advantage of the ceria coating is an enhanced chemical action of the abrasive particles, commonly referred to as the chemical tooth model. In this study we report the evolution of RR, haze, and defects such as particles and scratches in CMP experiments on high-density plasma (HDP) silicon oxide using four abrasive types (14 nm primary size ceria particles, 300 nm polymer particles, composites A and B) at pH 3 and 10. Interestingly, the two types of composite exhibit different RR. This is attributed to differences in morphology and surface composition. Composite B presents more similarities with the ceria, as confirmed by particle ñ silica surface adhesion forces in different pH solutions, measured by a colloidal AFM technique.Mater. Res. Soc. Symp. Proc. Vol. 991

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“…As it is well-known, soapless emulsion polymerization (SEP) method with no surfactants or trace of surfactants can be used to fabricate monodisperse polymeric latex particles with clean surfaces [14][15][16]. The latex particles fabricated by the SEP method are usually in the range of submicrometer or larger [17][18][19].…”

Section: Introductionmentioning

confidence: 99%