Size-Tunable Fabrication of Au Nanodot Arrays via Electrodeposition-Assisted Capillary Force Lithography

Liu, Kai; Yoo, Pil J.

doi:10.1166/mex.2012.1059

Cited by 2 publications

(1 citation statement)

References 28 publications

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“…[20][21][22][23] The trend of device down scaling and complicated stack structure motivates the enhanced metrology tool needed for foundry manufacturing. [24][25][26][27][28][29][30] Optical scatterometry technique is attracting attention to characterize critical dimensions (CDs) and overlays in the next generation semiconductor technology, due to its rapid measurement speed, nondestructive measurement, and complete pattern profile information, such as the width, side wall angle (SWA), and height. The experimental scatterometry spectra are collected and compared with the theoretical spectra calculated by the rigorous coupled wave Copyright: American Scientific Publishers analysis (RCWA) algorithm to extract the geometric shape information.…”

Section: Introductionmentioning

confidence: 99%

Gaussian Beam Incident on the One-Dimensional Diffraction Gratings with the High-K Metal Gate Stack Structures

Kuo¹,

Frederick²

2014

j nanosci nanotechnol

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Optical scatterometry has attracted extensive interest in extracting the geometric shape information of nanolithography patterns because of the trend of shrinking device size and complicated stack structure. RCWA is the numerical algorithm implemented in the current scatterometry tool to calculate the diffraction efficiency. However, the known weakness for the RCWA method is the analysis of metallic gratings illuminated by the TM wave. This research applies the FDTD method using the Gaussian beam excitation source to analyze the diffraction efficiency of HKMG gratings for the use in the optical scatterometry and verifies the numerical diffraction efficiency discrepancy between the Gaussian beam and plane wave excitation methods. The numerical study is carried out with the line/space nanolithography patterns on the HKMG process stacks at 45 nm node technology. The nanolithography patterns are modeled as 1-D surface relief gratings. The 0th order diffraction efficiency is analyzed as a function of CDs, SWAs, incident angles and pitches of the gratings. The study presents the impact of the polarizations of the incident waves on the diffraction efficiency. In addition, this research investigates the phase of the 0th diffraction order as a function of the SWAs and illustrates the corresponding SWA parameter effect on the phase distribution. This research suggests the minimum beam radius to converge the numerical diffraction efficiency using Gaussian beam excitation to it using the plan wave.

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Section: Introductionmentioning

confidence: 99%

Gaussian Beam Incident on the One-Dimensional Diffraction Gratings with the High-K Metal Gate Stack Structures

Kuo¹,

Frederick²

2014

j nanosci nanotechnol

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A Study on Fabrication Process of Gold Microdisk Arrays by the Direct Imprinting Method Using a PET Film Mold

Potejanasak

2021

Crystals

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In this study, an efficient nanofabrication process of metal microdisk arrays using direct imprinting was developed. This process was comprised of three steps; sputter etching on the quartz glass substrate, gold thin film deposition on an etched surface of a substrate, and transfer imprinting using a polyethylene terephthalate (PET) film mold on the Au thin film. A new idea to utilize a PET film mold for disk patterning by the nano transfer imprinting was examined. The PET film mold was prepared by thermally embossing the pillar pattern of a master mold on the PET film. The master mold was prepared from a silicon wafer. The PET film mold was used for transfer imprinting on a metal film deposited on a quartz substrate. The experimental results revealed that the PET film mold can effectively form gold micro-disk arrays on the Au film despite the PET film mold being softer than the Au film. This method can control the distribution and orientation of the nano-arrays on the disk. The plasmonic properties of the gold micro-disk arrays are studied and the absorbance spectrum exhibit depends on the distribution and orientation of gold micro-disk patterns. The nano-transfer imprinting technique is useful for fabricating metallic microdisk arrays on substrate as a plasmonic device.

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Size-Tunable Fabrication of Au Nanodot Arrays via Electrodeposition-Assisted Capillary Force Lithography

Cited by 2 publications

References 28 publications

Gaussian Beam Incident on the One-Dimensional Diffraction Gratings with the High-K Metal Gate Stack Structures

Gaussian Beam Incident on the One-Dimensional Diffraction Gratings with the High-K Metal Gate Stack Structures

A Study on Fabrication Process of Gold Microdisk Arrays by the Direct Imprinting Method Using a PET Film Mold

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