“…Recent advances in high-efficiency metasurfaces have been realized with low-loss dielectrics such as HfO 2 , TiO 2 , amorphous silicon and PbTe in the ultraviolet, visible and infrared region 1 – 5 , respectively. Using these optically lossless materials improves efficiency at design wavelengths and has led to various metasurface components such as pulse-shapers 6 , 7 , ultrafast beam deflectors 8 – 10 , metalenses 2 , 3 , depth sensors 11 – 13 , full-Stoke polarization cameras 14 , 15 and virtual and augmented reality components 16 – 20 . The manufacturing of these metasurface components, instead of grinding, polishing and molding used in conventional optical components, is based on lithography, the same approach for chip manufacturing.…”