Small Organic Molecule as Corrosion Inhibitors for Mitigating Metal Corrosion

Chopda, Lakha V.

doi:10.5772/intechopen.110161

Cited by 2 publications

(1 citation statement)

References 43 publications

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“…Studies found that functional groups, bonding and molecular sizes of atoms in organic inhibitors, were the factors that effected their effectivity in reducing corrosion rate [13]. The interactions between organic 68 molecules and metal surfaces perform a critical role in reducing corrosion rates and increasing inhibition efficacy [14]. One of the resources for such molecules could be from plant extracts, which have been proven to effectively reduced corrosion rate in previous studies [15], [16].…”

Section: Introductionmentioning

confidence: 99%

Analysis of The Corrosion Inhibition Efficacy of Camellia Sinensis Extract on Aluminium 6061 Alloys using Artificial Neural Network (ANN)

Andrean,

Harmayanti,

Wahjudi

et al. 2024

memi

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Aluminum alloys, well known for their corrosion resistance, could encounter corrosion issues in acidic environments. These environments induced pitting and exfoliation corrosion due to the absence of oxide layers from such alloys. Camellia sinensis extract, one of the organic extract, had inhibition compounds, including tannins and cathecins, that could inhibit corrosion and reduce the corrosion rate. Hence, this study investigated the corrosion inhibition efficacy of Camellia sinensis extract on Aluminum 6061 alloys when exposed to an acidic environment (1M HCl). Different concentrations of the extract were prepared to obtain the optimum concentration and achieve the highest inhibitor efficiency. In addition, an artificial neural network (ANN) model, was employed to predict polarization current in both inhibited and unhibited solutions. The model was designed using a configuration of one input, six hidden and one output ;ayers. The study discovered that the efficiency reached a remarkable level of 82.68% when using a concentration of 3000 ppm of Camellia sinensis extract. Furthermore, the ANN model demonstrated excellent performance in predicting polarization current across all variations, with determinant coefficient (R2) values of 0.995 for 0 ppm, 0.990 for 1000 ppm, 0.997 for 2000 ppm, 0.9996 for 3000 ppm, and 0.996 for 4000 ppm. These results indicated that the model was reliable in simulating the electrochemical analysis of corrosion behavior which could be used to develop a corrosion rate predictor in the future.

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Section: Introductionmentioning

confidence: 99%

Analysis of The Corrosion Inhibition Efficacy of Camellia Sinensis Extract on Aluminium 6061 Alloys using Artificial Neural Network (ANN)

Andrean,

Harmayanti,

Wahjudi

et al. 2024

memi

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Post Tungsten CMP Cleaning: Optimization for Cleaning Efficiency and Corrosion Reduction

Tseng,

Chu,

Siddiqui

et al. 2024

ECS J. Solid State Sci. Technol.

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Tungsten chemical-mechanical planarization (W CMP) is among the first applications of the CMP process implemented in high volume semiconductor manufacturing. Alkaline chemicals such as diluted NH4OH have been the predominant choice of post W CMP clean due to charge repulsion between W and dielectric/abrasive surface in high pH. However, W dissolution occurs spontaneously above pH ~4.0. Consequently, W corrosion can happen during post-CMP cleaning. From that perspective, acidic chemistry (e.g., pH< 4.0) seems a more benign choice to protect W, although at such low pH, isoelectric potential curves suggest coulombic attraction between W and oxide/silica surfaces, making it unfavorable for particle removal. The above pH dilemma for post-CMP cleaning and W protection can be managed by adding corrosion inhibitor to an alkaline chemical. Results from blanket and patterned wafers suggest reduction in surface defects and W dissolution can be accomplished simultaneously by an alkaline clean chemical with corrosion inhibitor (pH ~ 9.78), which shows high cleaning efficiency and reduced W loss than citric acid-based chemical (pH ~ 2.66), DIW, and diluted NH4OH. In addition, we show that DIW alone can induce severe W dissolution in features of fine geometry. Possible counter measures against such DIW-induced W corrosion are discussed.

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Small Organic Molecule as Corrosion Inhibitors for Mitigating Metal Corrosion

Cited by 2 publications

References 43 publications

Analysis of The Corrosion Inhibition Efficacy of Camellia Sinensis Extract on Aluminium 6061 Alloys using Artificial Neural Network (ANN)

Analysis of The Corrosion Inhibition Efficacy of Camellia Sinensis Extract on Aluminium 6061 Alloys using Artificial Neural Network (ANN)

Post Tungsten CMP Cleaning: Optimization for Cleaning Efficiency and Corrosion Reduction

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