2017 IEEE 44th Photovoltaic Specialist Conference (PVSC) 2017
DOI: 10.1109/pvsc.2017.8366041
|View full text |Cite
|
Sign up to set email alerts
|

SnS by Ionized Jet Deposition for photovoltaic applications

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
3

Citation Types

0
4
0

Year Published

2017
2017
2023
2023

Publication Types

Select...
5

Relationship

0
5

Authors

Journals

citations
Cited by 5 publications
(4 citation statements)
references
References 6 publications
0
4
0
Order By: Relevance
“…Due to material ablation instead of sputtering, almost any material can be deposited with very efficient material/target use. The IJD method has been successfully used to grow thin films from a wide range of complex materials on various substrates, such as hard metal carbides and nitrides on silicon, aluminium alloy and stainless steel substrates 32 , yttria-stabilized zirconia on SiO 2 , borosilicate, titanium and poly(ether ether ketone) 33 , tin sulfide layers on sodalime glass 34 , soft polymers on stainless steel and glass substrates 35 , and bone apatite-like films on silicon 36,37 . Hence, the IJD technique represents a versatile, very safe, and low-temperature process, which can be explored for TMDC growth, e.g., to obtain stoichiometric and crystalline 2H-MoS 2 without the use of hazardous gases such as hydrogen and sulfur, and carbon compounds, or other molecules (often used as catalysators in the synthesis).…”
Section: Introductionmentioning
confidence: 99%
“…Due to material ablation instead of sputtering, almost any material can be deposited with very efficient material/target use. The IJD method has been successfully used to grow thin films from a wide range of complex materials on various substrates, such as hard metal carbides and nitrides on silicon, aluminium alloy and stainless steel substrates 32 , yttria-stabilized zirconia on SiO 2 , borosilicate, titanium and poly(ether ether ketone) 33 , tin sulfide layers on sodalime glass 34 , soft polymers on stainless steel and glass substrates 35 , and bone apatite-like films on silicon 36,37 . Hence, the IJD technique represents a versatile, very safe, and low-temperature process, which can be explored for TMDC growth, e.g., to obtain stoichiometric and crystalline 2H-MoS 2 without the use of hazardous gases such as hydrogen and sulfur, and carbon compounds, or other molecules (often used as catalysators in the synthesis).…”
Section: Introductionmentioning
confidence: 99%
“…12 The selenizations were done in the same fashion as by Larsen et al 13 In order to achieve different anion ratios in the samples, the selenization temperature and duration were set for S1(S1 0 ), S2(S2 0 ), and S3(S3 0 ) in Table I as 530 C 10 min, 560 C 4 min, and 500 C, 10 min, respectively. The pure sulfide sample referred to as S4 in Table I was taken from our pervious work.…”
mentioning
confidence: 99%
“…While IBC Si cells are commercially available, back‐contact configurations in emerging, efficient PV such as III–V, CdTe, CIGS, and perovskite devices have been relatively less explored. [ 8–19 ] The key difference between silicon and such emerging technologies is the nature of the absorber layer. For silicon, which has an indirect bandgap, the minority carrier‐diffusion length ( L d ) is on the order of 100–1000 µm.…”
Section: Introductionmentioning
confidence: 99%