“…Due to material ablation instead of sputtering, almost any material can be deposited with very efficient material/target use. The IJD method has been successfully used to grow thin films from a wide range of complex materials on various substrates, such as hard metal carbides and nitrides on silicon, aluminium alloy and stainless steel substrates 32 , yttria-stabilized zirconia on SiO 2 , borosilicate, titanium and poly(ether ether ketone) 33 , tin sulfide layers on sodalime glass 34 , soft polymers on stainless steel and glass substrates 35 , and bone apatite-like films on silicon 36,37 . Hence, the IJD technique represents a versatile, very safe, and low-temperature process, which can be explored for TMDC growth, e.g., to obtain stoichiometric and crystalline 2H-MoS 2 without the use of hazardous gases such as hydrogen and sulfur, and carbon compounds, or other molecules (often used as catalysators in the synthesis).…”