1998
DOI: 10.1002/(sici)1521-3773(19980316)37:5<550::aid-anie550>3.0.co;2-g
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Soft Lithography

Abstract: Elastomeric stamps and molds provide a great opportunity to eliminate some of the disadvantages of photolithograpy, which is currently the leading technology for fabricating small structures. In the case of "soft lithography" there is no need for complex laboratory facilities and high-energy radiation. Therefore, this process is simple, inexpensive, and accessible even to molecular chemists. The current state of development in this promising area of research is presented here.

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Cited by 4,481 publications
(1,344 citation statements)
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References 161 publications
(357 reference statements)
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“…This geometry, consisting of two channels that intersect at 90 , is a convenient platform for generating a planar extensional flow. Masters for the cross-slots used for the cell experiments were made from SU-8 patterned on silicon wafers according to standard soft lithography approaches (25). Briefly, silicon wafers were precleaned with piranha solution (3:1 sulfuric acid to hydrogen peroxide), washed with deionized water, and baked at 120 C for 20 min to remove any moisture.…”
Section: Microfluidic Device Fabricationmentioning
confidence: 99%
“…This geometry, consisting of two channels that intersect at 90 , is a convenient platform for generating a planar extensional flow. Masters for the cross-slots used for the cell experiments were made from SU-8 patterned on silicon wafers according to standard soft lithography approaches (25). Briefly, silicon wafers were precleaned with piranha solution (3:1 sulfuric acid to hydrogen peroxide), washed with deionized water, and baked at 120 C for 20 min to remove any moisture.…”
Section: Microfluidic Device Fabricationmentioning
confidence: 99%
“…Alternatively, PDMS stamp molds were also fabricated by spin coating SU-8 negative photoresist (MicroChem, Newton, MA) onto a silicon wafer, exposing photoresist to UV through a mask for 10 s, and then developing the photoresist following the manufacturer's instructions. The mask was prepared using a computer drawing program to create a pattern that was printed onto a transparency [24,25], also with 1 mm features. PDMS (5.5 g) was poured onto the photolithographic mold, cured at 60 °C for 1-3 h, and then carefully peeled away from mold.…”
Section: Patterned Sams and Complex Depositionmentioning
confidence: 99%
“…SAMs can be used in conjugation with μCP, a soft lithographic technique, to imprint substrates with specific patterns of SAMs [21,22,24]. A PDMS stamp was used to imprint gold surfaces with specific patterns of hydrophilic alkanethiols (50% MUA) in a background of methylterminated alkanethiols (DT10).…”
Section: Patterned Sams and Complex Depositionmentioning
confidence: 99%
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“…Eliminating such a problem in real devices, at large dimensional scales, is impractical during both fabrication and performance, requiring additional steps including the use of the traditional patterning techniques involving multiple lithography steps and cleaning procedures, or always necessitating the wiring of the devices beforehand. [17][18][19] To overcome these limitations, our unique approach utilizes inorganic solid-binding peptides that are molecular linkers, functionalizing the QDots, and have specific material selectivity property, essential for selective spatial assembly. To demonstrate how this approach works, we show here the directed assembly of peptide-functionalized QDots only on the targeted optical windows of a nanocrystal-based color-conversion LED.…”
mentioning
confidence: 99%