2004
DOI: 10.1021/bk-2004-0874.ch010
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Soft Lithography on Block Copolymer Films: Generating Functionalized Patterns on Block Copolymer Films as a Basis to Further Surface Modification

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Cited by 4 publications
(3 citation statements)
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“…Poly(styrene- block -4-(2-(2-(2-acetoxy)ethoxy)ethoxy)styrene) (PS- b -PAEES) and poly(4-(2-(2-(2-acetoxy)ethoxy)ethoxy)styrene) (PAEES) were synthesized by TEMPO-based controlled radical polymerization, and the reaction details have been published elsewhere . The polymers were characterized by NMR and gel permeation chromatography (GPC) as described previously . Polystyrene was commercially available (Aldrich) and used as received.…”
Section: Methodsmentioning
confidence: 99%
“…Poly(styrene- block -4-(2-(2-(2-acetoxy)ethoxy)ethoxy)styrene) (PS- b -PAEES) and poly(4-(2-(2-(2-acetoxy)ethoxy)ethoxy)styrene) (PAEES) were synthesized by TEMPO-based controlled radical polymerization, and the reaction details have been published elsewhere . The polymers were characterized by NMR and gel permeation chromatography (GPC) as described previously . Polystyrene was commercially available (Aldrich) and used as received.…”
Section: Methodsmentioning
confidence: 99%
“…The symmetric diblock copolymer polystryene‐ block ‐poly(4‐(2‐(2‐(2‐acetoxy)ethoxy)ethoxy)styrene) (PS‐ b ‐PAEES), shown in Figure (A), was synthesized by TEMPO‐based controlled radical polymerization . The number‐average molecular weight ( M n ) is 31,900 with a polydispersity of 1.17 and about equal volume fractions of the two blocks ( M n [PS] = 19,600 and M n [PAEES] = 12,300).…”
Section: Methodsmentioning
confidence: 99%
“…(A) Molecular structure of the amphiphilic block copolymer PS‐ b ‐PAEES . (B) Lamella ordering of the film leads to a smooth surface if the as‐deposited film thickness matches the height of the lamella stack.…”
Section: Methodsmentioning
confidence: 99%