1997
DOI: 10.1016/s0368-2048(97)00026-1
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Soft X-ray spectromicroscopy development for materials science at the Advanced Light Source

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Cited by 48 publications
(31 citation statements)
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“…This picture is recorded at a wavelength of 2.07nm(600eV) with an exposure time of 1 sec. Note that the rings are smaller at 600eV than 500eV, as in figure 3-7, due to the shorter wavelength and thus reduced divergence angle as seen in equation (3)(4)(5)(6)(7)(8)(9)(10). 46…”
Section: -8mentioning
confidence: 98%
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“…This picture is recorded at a wavelength of 2.07nm(600eV) with an exposure time of 1 sec. Note that the rings are smaller at 600eV than 500eV, as in figure 3-7, due to the shorter wavelength and thus reduced divergence angle as seen in equation (3)(4)(5)(6)(7)(8)(9)(10). 46…”
Section: -8mentioning
confidence: 98%
“…The SXR region will be defined as ranging from approximately 200eV to 1keV (6 nm- fall within the EUV and SXR region. These edges create the ability to perform elemental and chemical identification [10].…”
Section: Motivationmentioning
confidence: 99%
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“…[17][18][19] Recently, analytical soft X-ray microscopy has been developed and applied to study polymers. [20][21][22][23] The scanning transmission X-ray microscope (STXM) [24][25][26][27] at the Advanced Light Source (ALS) used in this work provides images with better than 100 nm spatial resolution and a photon energy resolution of about 100 meV. Near-edge X-ray absorption fine structure (NEXAFS) spectral signals 28 are the basis for chemical speciation.…”
Section: Introductionmentioning
confidence: 99%