“…CoSb 3 -based filled skutterudites are considered as one kind of the most promising mid-temperature TE materials not only due to their good TE performance but also due to their low cost, high mechanical strength, and high thermal stability. ,− Hence, CoSb 3 -based filled skutterudites are popular for fabricating TE devices. ,, However, CoSb 3 -based TE materials can also have great interdiffusion or chemical reaction with most of the metal and alloy electrodes in the high-temperature range. ,, Therefore, the optimization of diffusion barrier materials is significant for CoSb 3 -based TE devices. As shown in previous reports, many metals and alloys have been used as diffusion barrier materials for CoSb 3 -based TE joints, such as Ti, ,− Ni, Co, Mo, Nb, Ti–Al alloys, , Al–Ni alloys, TaN–Ta–TaN alloys, Fe–Ni alloys, Ti–Mo alloys, and Co–Mo alloys . Among these diffusion barrier materials shown above, Ti and Ti-based alloys have been demonstrated as good candidates for the diffusion barrier materials of CoSb 3 -based TE joints. ,,,, Gu et al used the Ti–Al alloy as a barrier layer for n-type Yb 0.6 Co 4 Sb 12 TE materials, revealing that the intermetallic compounds of Ti 3 Al and TiAl formed in Ti–Al alloys can effectively hinder further interfacial diffusion.…”