1998
DOI: 10.1557/jmr.1998.0274
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Solid-phase reactions in Ir/(111)Si systems studied by means of x-ray emission spectroscopy

Abstract: High energy resolved x-ray emission spectroscopy with variable electron beam excitation is applied for study of solid-phase reactions in the Ir/(111)Si system as a function of annealing temperature. The formation of Ir silicides as a function of depth is studied by measurements of Si L2,3 x-ray emission valence spectra at different electron excitation energies (3–10 keV), and the results are compared with those of Rutherford backscattering.

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Cited by 7 publications
(6 citation statements)
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“…10 Under our processing conditions, this phase appears in the hexagonal form, as deduced from soft x-ray emission measurements. 12 The Raman spectra are separated into two spectral ranges. The different bands observed for each sample would allow the use of the Raman spectra as signatures of the different iridium silicides.…”
Section: Resultsmentioning
confidence: 99%
“…10 Under our processing conditions, this phase appears in the hexagonal form, as deduced from soft x-ray emission measurements. 12 The Raman spectra are separated into two spectral ranges. The different bands observed for each sample would allow the use of the Raman spectra as signatures of the different iridium silicides.…”
Section: Resultsmentioning
confidence: 99%
“…We conclude that these additional features near the Fermi energy are Table 3. Coordination numbers (CN) and average distances (AD) of Me-Me, Me-Si and Si-Si bonds (in Å) of 4d and 5d silicides obtained from [11] and [16][17][18][19][20] due to bands formed by hybridizing Si 3d states with the transition metal 4d and 5d states.…”
Section: Resultsmentioning
confidence: 99%
“…For the Ir-Si system a full set of binary compounds (high-temperature (HT) and low-temperature (LT) modifications of IrSi 3 , Ir 3 Si 5 and IrSi) was specially prepared (in connection with a study of solid-phase reactions at the Ir/Si interface under different heat treatments [17]). We also measured the XES and XPS spectra of these materials, shown in figures 1 and 2.…”
Section: Resultsmentioning
confidence: 99%
“…A single layer of IrSi 3 , 640 nm thick, was formed by annealing the samples at 675 • C for 15 s, and then processing further at 1000 • C for 5 s. Due to the coexistence of the Ir 3 Si 5 and IrSi compounds, even for very thin layers of IrSi, it is not possible to guarantee, with the experimental set-up and procedures described above, the formation of a single layer of IrSi. Therefore IrSi samples were prepared by arc melting of iridium and silicon in an argon atmosphere, and further annealed at 1000 • C [7].…”
Section: Methodsmentioning
confidence: 99%