2015
DOI: 10.1039/c5ra18682j
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Solid-state graphene formation via a nickel carbide intermediate phase

Abstract: Direct formation of graphene with a controlled number of graphitic layers on dielectric surfaces is achieved with an in-depth understanding of the solid-state growth mechanism.

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Cited by 41 publications
(29 citation statements)
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“…This also supports the existence of Ni 3 C phase in a wide temperature range (from room temperature to 800°C) based on the AES measurement, and its existence even at 1100°C based on the glancing-angle X-ray diffraction (GAXRD) measurement of the RTP growth. 49 Lindemann-index results for NiC, Ni, or a-C layers in Model VIII a-C/NiC and Model X a-C/Ni (ESI Fig. S5 †) are similar to those of Model I a-C/Ni 3 C (Fig.…”
Section: Resultssupporting
confidence: 62%
“…This also supports the existence of Ni 3 C phase in a wide temperature range (from room temperature to 800°C) based on the AES measurement, and its existence even at 1100°C based on the glancing-angle X-ray diffraction (GAXRD) measurement of the RTP growth. 49 Lindemann-index results for NiC, Ni, or a-C layers in Model VIII a-C/NiC and Model X a-C/Ni (ESI Fig. S5 †) are similar to those of Model I a-C/Ni 3 C (Fig.…”
Section: Resultssupporting
confidence: 62%
“…Contrary to some previous reports, 32,35 the Ni etching process is required to remove all the traces of the metal catalyst Ni. Actually, we have found no evidence supporting the idea that the Ni fully evaporates during the RTA process above 800 C. This is also conrmed by scanning electron microscope (SEM), energy dispersive X-ray spectroscopy (EDX) and X-ray diffraction (XRD) results.…”
Section: Characterization Of the Graphenementioning
confidence: 97%
“…Since both methods require a transferring process, graphene growth methods that allow for direct formation on silicon substrates have been sought aer and several attempts have been reported. [27][28][29][30][31][32][33][34][35][36][37][38][39][40] In this study, we developed a procedure to grow graphene from a solid-state carbon source directly on silicon substrates. To reduce the complexity of the process, the number of steps, and the cost, we have also developed a direct patterning procedure that allows to produce graphene samples with arbitrary position, size, and shape: notably this procedure does not require any dry etching process.…”
Section: Introductionmentioning
confidence: 99%
“…Meanwhile, nickel carbide may also anticipate the growth of graphene directly in case of a high ramping rate to reach the high temperature zone suitable for high quality graphene growth before the decomposition of nickel carbide. It has been shown by the work of Xiong et al and Lu and co‐workers in which Ni and amorphous carbon layer on a substrate were heated to 1100 °C in a ramping rate of 15 °C s −1 to induce the formation, migration, and decomposition of nickel carbide and finally carbon precipitation for graphene growth . Under our ultrafast annealing conditions, the rising time from 0 to 10 A is around 10 ms, resulting in a superfast ramping rate of temperature.…”
mentioning
confidence: 99%