Solution Processable High Performance Multiwall Carbon Nanotube–Si Heterojunctions

Dwivedi, Neeraj; Dhand, Chetna; Anderson, Erik; Kumar, Rajeev; Liao, Baochen; Yeo, Reuben J.; Khan, Raju; Carey, J. D.; Saifullah, Mohammad S. M.; Kumar, Sushil; Malik, Hitendra K.; Hashmi, S. A. R.; Srivastava, Avanish Kumar; Sankaranarayanan, Subramanian K. R. S.; Stangl, Rolf; Duttagupta, Shubham

doi:10.1002/aelm.202000617

Cited by 4 publications

(1 citation statement)

References 75 publications

(146 reference statements)

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“…To combat these concerns, one of the effective options is to apply hard and protective coatings. This is why the market for hard coatings has grown immensely over the years and is expected to reach about 1351.3 million USD by 2026 . Diamond is one of the hardest known materials, and the hard coatings based on diamond and nanodiamond are applied to enhance the surface protection and components’ lifetime .…”

Section: Introductionmentioning

confidence: 99%

Unusual High Hardness and Load-Dependent Mechanical Characteristics of Hydrogenated Carbon–Nitrogen Hybrid Films

Dwivedi

Balasubramanian

Sahu

et al. 2022

ACS Appl. Mater. Interfaces

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Mechanical components are exposed to a rigorous environment in a number of applications including engineering, aerospace, and automobiles. Thus, their service lifetime and reliability are always on the verge of risk. Protective coatings with high hardness are required to enhance their service lifetime and minimize the replacement cost and waste burden. Hydrogenated amorphous carbon including nitrogen-incorporated films, that are commonly deposited by plasma-enhanced chemical vapor deposition, are widely used for commercial protective coating applications. However, their mechanical hardness still falls into the moderate hard regime. This needs to be substantially enhanced for advanced applications. Here, we report the synthesis of very hard nanostructured hydrogenated carbon–nitrogen hybrid (n-C:H:N) films. The optimized n-C:H:N film displays a hardness of about 36 GPa, elastic modulus of 360 GPa, and reasonably good elastic recovery (ER) of 62.7%. The mechanical properties of n-C:H:N films are further tailored when nitrogen pressure is tuned during the growth. The realized remarkably improved mechanical properties are correlated with the films’ structural properties and experimental growth conditions. We also conducted density functional theory calculations that show the trend for the elastic modulus of the amorphous carbon films with varying nitrogen concentrations matches well with experimentally measured values. Finally, we probed load-dependent mechanical properties of n-C:H:N films and found an anomalous behavior; some of the mechanical parameters, for instance, ER, reveal an irregular trend with indentation load, which we explain in the framework of the film–substrate composite concept. Overall, this work uncovers many unknown and exciting mechanical phenomena that could pave the way for new technological developments.

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Section: Introductionmentioning

confidence: 99%

Unusual High Hardness and Load-Dependent Mechanical Characteristics of Hydrogenated Carbon–Nitrogen Hybrid Films

Dwivedi

Balasubramanian

Sahu

et al. 2022

ACS Appl. Mater. Interfaces

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Tin Lodide Thin Films Growth via Plasma Enhanced Chemical Vapor Deposition and its Optimization Using V–I Probe Impedance Analyser for Optoelectronic Applications

Yadav,

Kumar

2024

ChemistrySelect

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Tin(ii) iodide (SnI2) faces significant challenges in photodetector applications, primarily due to its sensitivity to moisture and degradation over time. Achieving uniform, high‐quality films with low impurity and defect levels is also a challenge. Potential solutions include advanced deposition techniques to improve film quality and stability, surface passivation and encapsulation, doping and alloying. In this study, SnI2 thin films have been deposited for the first time using plasma enhanced chemical vapour deposition (PECVD) technique to the best of our knowledge. Process parameters like deposition pressure and RF‐power have been optimised via non‐intrusive in‐situ V−I probe impedance analyser. SnI2 thin films have been deposited on glass & transparent conducting oxide (TCO) and p‐Si wafer at various RF‐power to make SnI2/p‐Si heterojunction followed by metallization to make Ag/SnI2/p‐Si/Ag heterojunction photodetector. Characterization techniques like thin film thickness measurement, UV‐Vis‐NIR spectroscopy, Photoluminescence spectroscopy, glancing incidence x‐ray diffraction (GIXRD), SEM and I−V measurements were carried out to study its optical, structural and electronic properties. Fabricated devices, Ag/SnI2/p‐Si/Ag heterojunction photodiode exhibits best critical performance for the film deposited at 150 W having rectifying ratio of 6.9×104 at 1.0 V and photo‐sensitivity of 1.6×104 at 100 mW/cm2 light intensity.

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Insights into the application of carbon materials in heterojunction solar cells

Deng

Liu

et al. 2023

Materials Science and Engineering: R: Reports

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Solution Processable High Performance Multiwall Carbon Nanotube–Si Heterojunctions

Cited by 4 publications

References 75 publications

Unusual High Hardness and Load-Dependent Mechanical Characteristics of Hydrogenated Carbon–Nitrogen Hybrid Films

Unusual High Hardness and Load-Dependent Mechanical Characteristics of Hydrogenated Carbon–Nitrogen Hybrid Films

Tin Lodide Thin Films Growth via Plasma Enhanced Chemical Vapor Deposition and its Optimization Using V–I Probe Impedance Analyser for Optoelectronic Applications

Insights into the application of carbon materials in heterojunction solar cells

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