Solution-Processable LaTiOx-PVP as Silicon-Free Gate Dielectric at Low Temperature for High-Performance Organic-Inorganic Field Effect Transistors

Najafi-Ashtiani, Hamed; Tavousi, Alireza; Ramzannezhad, Ali; Rahdar, Abbas

doi:10.1007/s11664-021-08766-2

Cited by 4 publications

(2 citation statements)

References 49 publications

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“…The stoichiometry and structure of metal oxides determine a host of physical parameters, including optical constants, [14,23,24] semiconductor properties and type of electron acceptor or donor states, [25,26] the bandgap energy, [27,28] as well as electrical and dielectric properties. [29][30][31] The obtained physical properties suit the metal oxide films to a variety of applications, including photovoltaic solar cells, [32] gas sensors, [33,34] thin-film transistors, [35][36][37] light-emitting diodes, [38,39] and chromogenic devices. [40,41] Chromogenic property is the reversible ability to change color in materials in response to external stimuli.…”

Section: Introductionmentioning

confidence: 99%

Tungsten Oxide Thin Films for Electrochromic Applications: Pulse Width‐Controlled Deposition by High‐Power Impulse Magnetron Sputtering

Najafi‐Ashtiani,

Bilek,

Akhavan

2024

Adv Eng Mater

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Metal oxide thin films have been of prime interest among electrochromic materials because of their chemical stability, strong adherence to various substrates, and high coloration efficiency. Compared to other transition metal oxides, such as V2O5, MoO3, and TiO2, tungsten oxide (WO3) exhibits superior electrochromic properties, including long‐term durability and excellent contrast ratio. High‐power impulse magnetron sputtering (HiPIMS) holds great potential in fabricating durable WO3‐based electrochromic layers. However, the tungsten target‐plasma interactions in reactive‐HiPIMS deposition of WO3 and their role in modulating the electrochromic function of the resulting WO3 coatings are yet to be understood. Here, we provide evidence that by controlling the HiPIMS pulse length, the stoichiometry of tungsten oxide structures can be tuned to optimize the transparency and electrochromic function of the coatings. X‐ray photoelectron spectroscopy (XPS) data showed that at pulse lengths shorter than 85 μs, the concentration of suboxide compounds is less than that of tungsten trioxide, while for pulse lengths longer than 100 μs, this balance is reversed. The average optical transparency of the coatings in the range of visible light was higher than 80%. The optical transmittance modulation (ΔT) of 38.1, 36.2 and 34.3% and coloration efficiency of 41.3, 38.4, and 35.9 cm2 C−1 were measured for the WOx samples deposited at pulse lengths of 70, 85 and 100 μs, respectively. Tuning the HiPIMS pulse characteristics is a simple strategy to deposit tungsten oxide films with tuned electrochromic properties for an array of applications, from smart windows to wearable displays.This article is protected by copyright. All rights reserved.

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Section: Introductionmentioning

confidence: 99%

Tungsten Oxide Thin Films for Electrochromic Applications: Pulse Width‐Controlled Deposition by High‐Power Impulse Magnetron Sputtering

Najafi‐Ashtiani,

Bilek,

Akhavan

2024

Adv Eng Mater

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“…In recent years, the application of composite materials in flexible TFT has been paid more and more attention. , Many researchers have successfully applied composite films to the gate dielectric layer and active layer of flexible TFT, and the composite films showed both excellent electrical and mechanical performance. − Researchers have also used the polymer-containing precursor sol to optimize the printing quality, such as improving the printing accuracy as well as film uniformity. , Our previous work has also proven that water-soluble polymer can act as effective functional additive of oxide ink, which can help to improve uniformity of printed film, reduce annealing temperature, and modulate threshold voltage. − However, compared with the traditional precursor sol, the composition and physicochemical properties of composite ink are more complex, which brings uncertainty to printing composite film of high quality. Therefore, one of a key factor to develop composite ink system is to understand the interaction mechanism of ink components in the process of film formation, which will help guide the design of ink components and improve the quality of printed film.…”

Section: Introductionmentioning

confidence: 99%

Study on the Film-Forming Mechanism of Polymer–Metal Oxide Composite Ink Systems Containing Different Polymer Molecules

et al. 2023

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A printable, flexible display panel is an important trend in the field of information display, which requires better mechanical and electrical properties of device materials. Polymer− metal oxide composite materials are promising in the functional layer of a thin-film transistor (TFT) and can be sufficiently fabricated by polymer−metal salt solution systems through the sol−gel process. For the development of polymer−metal oxide composite ink, it is necessary to study the film-forming mechanism of the composite film during solidification, which is an important reference in ink component design. However, the evolution of the composite structure is quite complex, which brings a challenge to characterization and analyzation. We applied a series of characterization methods to study the film-forming process of composite ink from sol to gel and to solid, and an emerging testing technology, nano-infrared spectroscopy (nano-IR), was applied to characterize the gel film. The research conclusion showed that the type of functional group can significantly affect the morphology of the initial particle and can finally determine the microstructure of the composite film. The study provides references for the development of composite ink as well as the characterization method for ink and film with complex composition.

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Flexibility investigation of free-silicon organic–inorganic (ZrTiHfO2-PVP) hybrid films as a gate dielectric

Najafi-Ashtiani

Rahdar

2021

Appl. Phys. A

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Solution-Processable LaTiOx-PVP as Silicon-Free Gate Dielectric at Low Temperature for High-Performance Organic-Inorganic Field Effect Transistors

Cited by 4 publications

References 49 publications

Tungsten Oxide Thin Films for Electrochromic Applications: Pulse Width‐Controlled Deposition by High‐Power Impulse Magnetron Sputtering

Tungsten Oxide Thin Films for Electrochromic Applications: Pulse Width‐Controlled Deposition by High‐Power Impulse Magnetron Sputtering

Study on the Film-Forming Mechanism of Polymer–Metal Oxide Composite Ink Systems Containing Different Polymer Molecules

Flexibility investigation of free-silicon organic–inorganic (ZrTiHfO2-PVP) hybrid films as a gate dielectric

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