2016
DOI: 10.1063/1.4947891
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Solution processed chalcogenide films and micro-patterns via self-assembly

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Cited by 2 publications
(4 citation statements)
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“…Once the chelation has saturated, the solution reaches equilibrium state and maintains its stability. 30 It is also observed that although the dissolution of ChG increases significantly at higher temperatures, the extent of solution contamination due to moisture and oxygen assimilation also increases. Hence the best solution preparation temperature is at 80 °C, with continuous stirring.…”
Section: Resultsmentioning
confidence: 97%
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“…Once the chelation has saturated, the solution reaches equilibrium state and maintains its stability. 30 It is also observed that although the dissolution of ChG increases significantly at higher temperatures, the extent of solution contamination due to moisture and oxygen assimilation also increases. Hence the best solution preparation temperature is at 80 °C, with continuous stirring.…”
Section: Resultsmentioning
confidence: 97%
“…[36][37][38][39] Evaporative self-organization of non-volatile components has been tested as an easy approach to form micro/nano domains in a dened order. 30,39 Taking advantage of part solvent present in the freshly coated ChG lms, same strategy can be used to conne and organize ChG units in a pre-patterned order. Concentration of solute determines the size and shape of these domains, as the other control parameters such as pattern dimensions, processing temperature, molecular weight of solute, substrate etc.…”
Section: Film Preparationmentioning
confidence: 99%
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“…The error in the thickness measurement was estimated to be AE 2.5%. The¯lms prepared from 0.6 g/ml solution are usually thicker and can be used to fabricate optical components such as micro-lenses or waveguides with high sag (hight of the structure) value (16-18 m), 19,26 whereas thin¯lms of the order of sub-microns can be prepared by 0.4 g/ml or less loading solution. Hence, thick and thin¯lms could be prepared from these solutions while varying the spin speed and concentration of the solution.…”
Section: Thin¯lm Preparationmentioning
confidence: 99%