2022
DOI: 10.1016/j.vacuum.2022.111064
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Solution-processed Y-doped SnSrO3 electron transport layer for Ga2O3 based heterojunction solar-blind photodetector with high sensitivity

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Cited by 28 publications
(14 citation statements)
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“…The absorbance and transmittance of each thin film grown on sapphire were measured by a UV−visible spectrophotometer (Perkin Elmer LAMBDA 265). 29,30 The monochromatic light sources used in the measurement were 255, 310, 404, 532, and 635 nm, respectively.…”
Section: Methodsmentioning
confidence: 99%
“…The absorbance and transmittance of each thin film grown on sapphire were measured by a UV−visible spectrophotometer (Perkin Elmer LAMBDA 265). 29,30 The monochromatic light sources used in the measurement were 255, 310, 404, 532, and 635 nm, respectively.…”
Section: Methodsmentioning
confidence: 99%
“…As an essential component of spectrum detectors, the deep-ultraviolet (DUV, 200–280 nm) photodetector has a variety of vital uses, including in missile tracking, navigation, communication, and monitoring. Despite their low price and maturity in technology, traditional silicon-based DUV photodetectors have limited responsivity to DUV light, a small penetration depth for high-energy ultraviolet photons, and a low filtration dependency on such photons. Recently, wide-bandgap semiconductors such as MgZnO, , AlGaN, , diamond, and Ga 2 O 3 have been considered alternatives to Si in advanced DUV photodetectors. Ga 2 O 3 is the most ideal option for DUV photodetector applications among the numerous wide-bandgap semiconductors because of its ultrawide bandgap (4.5–4.9 eV), strong UV photon absorption coefficient, high structural stability, and affordability.…”
Section: Introductionmentioning
confidence: 99%
“…Unlike commercially available UV PDs based on narrow-band-gap semiconductor materials such as Si and GaAs, they do not require any additional optical filter or large cooling systems. ,− Among these, β-Ga 2 O 3 has received a lot of attention because of its excellent material properties such as an ultrawide direct band gap of about 4.9 eV, superior radiation hardness, high chemical and thermal stability, and high absorption coefficient (>10 5 cm –1 ). In addition, to date, high-crystalline-quality Ga 2 O 3 single-crystal substrates, epilayers, and thin films could be grown quite maturely and cost-effectively by various melt growth and thin-film techniques including edge-defined film-fed growth (EFG), Czochralski (CZ) method, MOCVD, halide vapor-phase epitaxy (HVPE), atomic layer deposition (ALD), pulsed laser deposition (PLD), and molecular beam epitaxy (MBE) without any doping complexity in comparison to other wide and ultrawide-band-gap semiconductor materials. Apart from the β-phase, DUV PDs have also been demonstrated on amorphous and ε-phases of Ga 2 O 3 . ,, …”
Section: Introductionmentioning
confidence: 99%