1977
DOI: 10.1021/ja00449a044
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Some acyclic pentaalkoxyphosphoranes

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Cited by 43 publications
(11 citation statements)
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“…Based on the Livinghouse conditions,' a solution of methyl benzenesulfenate (0.126 g; 0.875 mmol, prepared from diphenyldisulfide following the methods of Mueller and Butler (14) and Denny and co-workers (15), in MeN0, (1 1.9 mL) was cooled to -30°C under argon. Previously prepared BF3/MeN02 (1.34 mL of 1.24 M) was added and after stirring 2.5 min the diene 5a (0.207 g; 0.817 mmol) was added in MeNO, (2 mL) and stirring was continued for 2 h at -30°C.…”
Section: Cyclization Of Diene 5amentioning
confidence: 99%
“…Based on the Livinghouse conditions,' a solution of methyl benzenesulfenate (0.126 g; 0.875 mmol, prepared from diphenyldisulfide following the methods of Mueller and Butler (14) and Denny and co-workers (15), in MeN0, (1 1.9 mL) was cooled to -30°C under argon. Previously prepared BF3/MeN02 (1.34 mL of 1.24 M) was added and after stirring 2.5 min the diene 5a (0.207 g; 0.817 mmol) was added in MeNO, (2 mL) and stirring was continued for 2 h at -30°C.…”
Section: Cyclization Of Diene 5amentioning
confidence: 99%
“…Thus, chlorination of thiol 1 with sulfuryl chloride furnished 4. Sulfenyl chloride 4 was condensed with (À)-menthol at 0°C in the presence of Et 3 N as previously described for the preparation of alkyl benzenesulfenates 19 to provide the desired sulfenate 5, although, in only 20% yield.…”
Section: Resultsmentioning
confidence: 99%
“…16 Ethyl benzenesulfenate was prepared as described earlier. 22 Sulfenylhalogenation of alkenes and dienes with ethyl benzene sulfenate in the presence of trimethylsilyl halides or thionyl halides (general procedure). A solution of trimethylsilyl halide or thionyl halide in anhydrous CHCl 3 (or CH 2 Cl 2 ) was slowly added drop wise under dry argon at room temperature to a vigorously stirred solution of an approximately equimolar mixture of an alkene (or a diene) and ethyl benzenesulfenate in the corresponding solvent.…”
Section: Methodsmentioning
confidence: 99%