“…In this article, we report an alternative approach of mass fabrication of silver NPs on top of the semiconductor interface, which is known as the electroless deposition of metal. Electroless plating has attracted great interest due to the simplicity of operation, costeffectiveness, high throughput, and the limited requirements of elaborate equipment [47,48]. Over the last few years, in contrast to complex and expensive vacuum methods of metallization, electroless deposition, as an alternative to colloidal solutions and self-assembly techniques, has also been used as a worthwhile method for the fabrication of metallic NPs on different surfaces [49][50][51][52].…”