Source optimization for three-dimensional image designs through film stacks

Abstract

In this paper, we will outline the approach for optimizing the illumination conditions to print three-dimensional images in resist stacks of varying sensitivity in a single exposure. The algorithmic approach for acheiving both optimal common and weakest window is presented. Results will be presented which demonstrate the ability of the technique to create threedimensional structures. The performance of the common and weakest window formulation will be explored using this approach. Additionally, due to physical restrictions there are limitations to the type of patterns that can be printed with a single exposure in this manner, thus the abilities of such a technique will be explored.

Computational lithography: Exhausting the resolution limits of 193-nm projection lithography systems

“…110,136,156,157 In this section, two results are presented. 110,136,156,157 In this section, two results are presented.…”