2012 International Conference on High Voltage Engineering and Application 2012
DOI: 10.1109/ichve.2012.6357154
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Space charge and thickness dependent dc electrical breakdown of solid dielectrics

Abstract: A new model based on space charge dynamics under very high dc electric field has been proposed to explain thickness dependent dielectric breakdown. Space charge phenomenon under high electric field has been studied for several decades thanks to the development of new charge mapping techniques. Overwhelming evidences show that the charge packet can be formed in the material under high electric field. The formation and dynamics of the charge packet will result in local electric field enhancement that has a direc… Show more

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Cited by 6 publications
(4 citation statements)
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“…Figure 12 indicates that, for SiO 2 , E bd~( 1/t diel ) s with s = 0.22. The reduction in E bd with increases in t diel is not just a SiO 2 characteristic but seems to be a general trend for all polar solid dielectrics [13] [14].…”
Section: Impact Of Increases In L On Dielectric Breakdown Strengthmentioning
confidence: 84%
“…Figure 12 indicates that, for SiO 2 , E bd~( 1/t diel ) s with s = 0.22. The reduction in E bd with increases in t diel is not just a SiO 2 characteristic but seems to be a general trend for all polar solid dielectrics [13] [14].…”
Section: Impact Of Increases In L On Dielectric Breakdown Strengthmentioning
confidence: 84%
“…Figure 4b presented the DC resistivity as a function of electric field and Figure 5b shows the corresponding DC currents of 6 min step tests. As it was discussed earlier, the DC resistivity behavior of the studied coating can be divided into different areas:  electric field below 0.5 V/µm: the resistivity behaves ohmicly, ~ 10 12 Ωm  electric field from 1 V/µm to 8…12 V/µm: the resistivity behaves non-ohmicly  electric field from 8…12 V/µm to 25 V/µm: the resistivity behaves ohmicly at a new region, ~10 9 Ωm  electric field above ~25 V/µm: degradation/prebreakdown region From Figure 5b it can be noticed that the currents of all S-samples stabilized at the first step (~ 1 V/µm) in the end of the measurement period although the values are different. At the second step (~ 2 V/µm) the currents of samples S3 and S4 stabilized while the currents of the other samples started to gradually increase.…”
Section: 32mentioning
confidence: 95%
“…When the applied field was from 0.5 V/µm to 8…12 V/µm, the resistivity was in the nonohmic region and decreased approximately three decades (Figure 4b). At the field strengths from 8…12 V/µm to 25 V/µm the resistivity was settled to ~10 9 Ωm, (except in case of sample S3). When the applied field was close to the breakdown strength, the resistivity started to slightly decrease which can be seen in Figure 4b indicating an initiation of degradation/prebreakdown process approximately from 25 V/µm.…”
Section: Resistivitymentioning
confidence: 99%
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