2021
DOI: 10.1088/1361-6463/ac41fa
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Space charge capacitance study of GaP/Si multilayer structures grown by plasma deposition

Abstract: Microcrystalline GaP/Si multilayer structures grown on GaP substrates using combination of PE-ALD for GaP and PECVD for Si layers deposition are studied by three main space charge capacitance techniques: C-V profiling, admittance spectroscopy (AS) and deep level transient spectroscopy (DLTS), which have been used on Schottky barriers formed on the GaP/Si multilayer structures. C-V profiling qualitatively demonstrates an electron accumulation in the Si/GaP wells. However, quantitative determination of the conce… Show more

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Cited by 2 publications
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“…Therefore, one of the most promising methods for determining the concentration profile of free charge carriers is the method of capacitance-voltage (or C-V) profiling [9]. It is successfully used to observe the distribution of carriers in semiconductor low-dimensional structures [10][11][12], including superlattices [13].…”
Section: Introductionmentioning
confidence: 99%
“…Therefore, one of the most promising methods for determining the concentration profile of free charge carriers is the method of capacitance-voltage (or C-V) profiling [9]. It is successfully used to observe the distribution of carriers in semiconductor low-dimensional structures [10][11][12], including superlattices [13].…”
Section: Introductionmentioning
confidence: 99%