Spatial resolution of soft-error sensitive-depth analysis by scanning two-photon absorption laser microscopy

Abstract

Soft errors are widely recognized as a reliability issue, and are a circuit malfunction caused by particle radiation. Identifying soft-error sensitive volumes of a semiconductor circuit is useful for evaluating soft-error sensitivity and developing countermeasures against soft errors. This paper quantifies the spatial resolution of soft-error sensitive-volume analysis by scanning two-photon absorption laser microscopy. We identify the critical parameter determining the spatial resolution in the depth direction and demonstrate that optimal parameter selection can extract soft-error sensitive depths of current LSIs.