Special Issue “Pulsed Laser Deposition of Thin Films: Recent Advances and Challenge”

Axente, E.; Socol, G.

doi:10.3390/coatings12030368

Cited by 3 publications

(3 citation statements)

References 9 publications

Supporting

Mentioning

Contrasting

Order By: Relevance

“…The current methods for preparing nickel coating mainly include chemical plating [5], vapor deposition [6], laser-assisted [7,8], and electrodeposition [9]. The process of chemical plating is simple and does not require electricity, but its disadvantage is that the coating thickness is large, and the uniformity is poor [10].…”

Section: Introductionmentioning

confidence: 99%

Research on the manufacturing of nickel coatings by jet electrodeposition after laser pretreatment with different media

Jiang,

Cheng,

Zhai

et al. 2024

Surf. Topogr.: Metrol. Prop.

View full text Add to dashboard Cite

This study aims to address the corrosion issues faced by 45 steel to meet its usage requirements and propose a method combining liquid-phase assisted laser and jet electrodeposition. In this method, the sample surface was the first laser pretreated in different media, and then Ni was deposited on its surface using jet electrodeposition. This paper investigates in detail the effects of laser pretreatment on the surface quality of nickel coating after jet electrodeposition in four different media (Air, Water, Saturated NaHCO3, 95%C2H5OH+5%H2O2). The experimental results indicate that liquid-phase assisted laser pretreatment had improved the surface quality of Ni coating. Especially after laser pretreatment in saturated NaHCO3 medium, the adhesion of the deposited coating increased by 50% compared to air, and the roughness decreased from 20.945 μm in the air to 0.373 μm. The corrosion current density decreased from 120.2 μA·cm-2 on the substrate to 1.605 μA·cm-2.

show abstract

Section: Introductionmentioning

confidence: 99%

Research on the manufacturing of nickel coatings by jet electrodeposition after laser pretreatment with different media

Jiang,

Cheng,

Zhai

et al. 2024

Surf. Topogr.: Metrol. Prop.

View full text Add to dashboard Cite

show abstract

“…Among the different deposition methods, the pulsed laser deposition (PLD) technique is considered a highly versatile technique for a growing number of thin film applications [5][6][7][8][9][10][11][12]. PLD uses high-energy laser pulses to vaporize the surface of a solid target inside a vacuum chamber and condenses the vapor on a substrate to form a film.…”

Section: Introductionmentioning

confidence: 99%

Synthesis and Characterization of a Zirconium (Zr) Thin Film on Si(100) via Pulsed Laser Deposition

Khuzhakulov,

Kylychbekov,

Allamyradov

et al. 2023

Coatings

View full text Add to dashboard Cite

Zirconium (Zr) thin films were deposited on silicon using pulsed laser deposition (PLD) with two laser wavelengths (1064 nm and 532 nm) and varying substrate temperatures (25 °C, 300 °C, and 500 °C) and laser fluences (0.25, 0.5, 1.0 J/cm2). Results indicate that smoother films were obtained with 1064 nm and surface roughness increased with higher fluences. Optimal crystalline films were obtained at 300 °C. XRD, SEM, and AFM analysis revealed distinct patterns and peaks related to laser parameters. The growth mechanisms of a Zr film were computed based on a well-known continuum model of thin film growth. Our simulations agree with experimental observations. The study highlights crucial factors affecting Zr thin film deposition and provides insights for optimizing PLD parameters to achieve high-quality films.

show abstract

“…PLD is a physical vapor deposition technique that uses high-energy laser pulses to ablate the target’s material to obtain, via vapor condensation on a substrate, thin films with excellent structural and optical properties. This technique is powerful and versatile, allowing for the precise control of the thin film’s thickness, stoichiometry, and composition, making it an excellent method for the synthesis of complex structures and composites [ 17 , 18 , 19 ].…”

Section: Introductionmentioning

confidence: 99%

Optical and Structural Analysis of TiO2–SiO2 Nanocomposite Thin Films Fabricated via Pulsed Laser Deposition Technique

et al. 2023

View full text Add to dashboard Cite

TiO2–SiO2 nanocomposite thin films have gained the attention of the scientific community due to their unique physical and chemical properties. In this paper, we report on the fabrication and characterization of a TiO2–SiO2 nanocomposite disk-shaped target. The target was used for the deposition of TiO2–SiO2 nanocomposite thin films on fluorine-doped tin oxide/glass substrates using the pulsed laser deposition (PLD) technique. The thicknesses of the thin films were fixed to 100 nm, and the deposition temperature ranged from room temperature to 300 °C. As revealed by the microstructural and morphological characterizations revealed, the TiO2–SiO2 nanocomposite thin films are amorphous and display homogeneous distribution. The determined values of the indirect optical band gap range from 2.92 to 3.07 eV, while those of the direct optical band gap lie between 3.50 and 3.55 eV. Additionally, as the deposition temperature decreases, the light transmission increases in the visible and in the ultraviolet ranges, which is suitable for flexible perovskite solar cells. This research can uncover new insights into the fabrication of amorphous TiO2–SiO2-based nanostructured thin films using the PLD technique for perovskite solar cell technology.

show abstract

Special Issue “Pulsed Laser Deposition of Thin Films: Recent Advances and Challenge”

Abstract: Since its introduction several decades ago, Pulsed Laser Deposition (PLD), has proved to be a powerful technique for synthesizing a broad spectrum of functional thin films [...]

Cited by 3 publications

References 9 publications

Research on the manufacturing of nickel coatings by jet electrodeposition after laser pretreatment with different media

Research on the manufacturing of nickel coatings by jet electrodeposition after laser pretreatment with different media

Synthesis and Characterization of a Zirconium (Zr) Thin Film on Si(100) via Pulsed Laser Deposition

Optical and Structural Analysis of TiO2–SiO2 Nanocomposite Thin Films Fabricated via Pulsed Laser Deposition Technique

Contact Info

Product

Resources

About