Spectral characterization of EUV radiation emitted from a laser-irradiated gas puff target

Kranzusch, Sebastian; Mann, Klaus

doi:10.1016/s0030-4018(01)01639-x

Cited by 58 publications

(31 citation statements)

References 16 publications

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“…Fig. 1) [10][11][12]. EUV radiation is generated by focusing a Nd:YAG laser (Innolas, wavelength 1064 nm, pulse energy 700 mJ, pulse duration 8.8 ns) onto a rotating solid Au target, yielding a plasma diameter of about 50 µm (FWHM) [9].…”

Section: Methodsmentioning

confidence: 99%

EUV damage threshold measurements of Mo/Si multilayer mirrors

et al. 2012

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We present 1-on-1 and 10-on-1 damage threshold investigations on Mo/Si multilayers with EUV radiation of 13.5 nm wavelength, using a table-top laser produced plasma source based on solid gold as target material. The experiments were performed on different types of Mo/Si mirror, showing no significant difference in single pulse damage thresholds. However, the damage threshold for ten pulses is ≈60 % lower than the single pulse threshold, implying a defect dominated damage process. Using Nomarski (DIC) and atomic force microscopy (AFM) we analysed the damage morphologies, indicating a primarily thermally induced damage mechanism. Additionally, we studied the radiationinduced change of reflectivity upon damage of a multilayer mirror.

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Section: Methodsmentioning

confidence: 99%

EUV damage threshold measurements of Mo/Si multilayer mirrors

et al. 2012

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“…Fig. 1) [21][22][23]. EUV radiation is generated by focusing a Nd:YAG laser (Innolas, wavelength 1064 nm, maximum pulse energy 700 mJ, pulse duration 8.8 ns) onto gaseous or solid targets [26,28].…”

Section: Methodsmentioning

confidence: 99%

Ablation of polymers by focused EUV radiation from a table-top laser-produced plasma source

2011

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We have investigated ablation of polymers with radiation of 13.5 nm wavelength, using a table-top laser produced plasma source based on solid gold as target material. A Schwarzschild objective with Mo/Si multilayer coatings was adapted to the source, generating an EUV spot of 5 µm diameter with a maximum energy density of ∼1.3 J/cm 2 . In combination with a Zirconium transmission filter, radiation of high spectral purity (2% bandwidth) can be provided on the irradiated spot. Ablation experiments were performed on PMMA, PTFE and PC. Ablation rates were determined for varying fluences using atomic force microscopy and white light interferometry. The slopes of these curves are discussed with respect to the chemical structure of the polymers. Additionally, the ablation behavior in terms of effective penetration depths, threshold fluences and incubation effects is compared to literature data for higher UV wavelength.

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“…Using laser plasmas generated in short-pulsed gaseous targets enables the construction of long-term stable, clean and compact soft x-ray sources [16,17], which have already been successfully applied in various fields, ranging from material ablation and structuring [18,19] to absorption spectroscopy [20] and transmission x-ray microscopy [21,22]. As the plasma size increases using a gaseous target as alternative to solids or liquid jet target concepts, the photon yield and peak brilliances are smaller.…”

Section: Introductionmentioning

confidence: 99%