2024
DOI: 10.1063/5.0220315
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Spectral in situ ellipsometer for thin layer measurements in thermonuclear fusion applications

Maciej Krychowiak

Abstract: Ellipsometry is widely used to characterize the thickness and optical parameters of thin films deposited, for example, in industrial processes. It is based on the measurement of polarization change upon reflection of, for example, visible light at a material sample. Commercially available devices are designed for stationary applications and often rely on precise geometric adjustment of the optical setup to maximize the measurement precision. In this work, a simplified spectral ellipsometer is proposed and test… Show more

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