Spectroscopic ellipsometry and reflectometry of statistically rough surfaces exhibiting wide intervals of spatial frequencies

Abstract

Two optical methods for the optical characterization of the statistically rough surfaces exhibiting wide intervals of spatial frequencies are presented. These methods employ the combination of variable angle spectroscopic ellipsometry and near‐normal spectroscopic reflectometry. The first method is based on combining the scalar diffraction theory and effective medium theory while the second method combines the scalar diffraction theory with Rayleigh‐Rice theory.Both the methods are applied to the optical characterization of statistically rough GaAs surfaces prepared by thermal oxidation. It is shown that both the methods can be utilized for characterization of these surfaces in a reasonable way, however, the latter is more suitable for this purpose. The results of the optical characterization of the selected rough GaAs surface are supported by those obtained using atomic force microscopy. (© 2008 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)

Simultaneous determination of optical constants, local thickness and roughness of ZnSe thin films by imaging spectroscopic reflectometry

“…However, it is reasonable to expect that the overlayers growing at the upper boundaries of ZnSe films have the same optical properties if the ZnSe thin films are prepared by the same or similar technology as in [11]. Optical constants of the GaAs substrate were fixed at values determined previously using the single-wavelength method [45].…”