2010
DOI: 10.1063/1.3277016
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Spectroscopic ellipsometry study of hydrogenated amorphous silicon carbon alloy films deposited by plasma enhanced chemical vapor deposition

Abstract: The optical properties of the hydrogenated amorphous silicon carbon alloy films, prepared by plasma enhanced chemical vapor deposition technique from silane and methane gas mixture diluted in helium, have been investigated using variable angle spectroscopic ellipsometry in the photon energy range from 0.73 to 4.59 eV. Tauc–Lorentz model has been employed for the analysis of the optical spectra and it has been demonstrated that the model parameters are correlated with the carbon content as well as to the struct… Show more

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Cited by 21 publications
(15 citation statements)
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“…Theory of spectroscopic ellipsometry Spectroscopic ellipsometry for being comprehensive, non-contact, non-destructive, and also offering the possibility of in-situ characterization has become an effective surface probe 20,21,[26][27][28] for the optical characterization of thin films of interest. The SE spectra were denoted by the parameters W and D. RHO (q) represents the amplitude ratio of r p and r s , the reflection coefficients of the polarized light corresponding to parallel and perpendicular to the incident plane, respectively, while W denotes the amplitude ratio (tan(W) ¼ jr p j/jr s j) and D represents the phase shift between p and s components, respectively.…”
Section: Spectroscopic Ellipsometric Measurements Of Hfo 2 Thin mentioning
confidence: 99%
“…Theory of spectroscopic ellipsometry Spectroscopic ellipsometry for being comprehensive, non-contact, non-destructive, and also offering the possibility of in-situ characterization has become an effective surface probe 20,21,[26][27][28] for the optical characterization of thin films of interest. The SE spectra were denoted by the parameters W and D. RHO (q) represents the amplitude ratio of r p and r s , the reflection coefficients of the polarized light corresponding to parallel and perpendicular to the incident plane, respectively, while W denotes the amplitude ratio (tan(W) ¼ jr p j/jr s j) and D represents the phase shift between p and s components, respectively.…”
Section: Spectroscopic Ellipsometric Measurements Of Hfo 2 Thin mentioning
confidence: 99%
“…Sok esetben azonban éppen nem a sztöchiometrikus összetétel a cél, mert a szilícium és szén arányának változtatásával hangolhatóvá válik a réteg több tulajdonsága, például a tiltottsáv-szélessége vagy a törésmutatója [48]. Az ilyen változó összetételű rétegeknek is több alkalmazása lehet, pl.…”
Section: Szilícium-karbidunclassified
“…Az ilyen változó összetételű rétegeknek is több alkalmazása lehet, pl. vékonyréteg tranzisztorok, napelemek, fotodetektorok [38,[48][49][50][51].…”
Section: Szilícium-karbidunclassified
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