Spectroscopic investigation of an expanding surface wave produced plasma

Berndt, Johannes; Douai, D.; Winter, J.

doi:10.1063/1.1433497

Cited by 8 publications

(3 citation statements)

References 14 publications

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“…The ion fluxes which impinge onto the substrate all exhibit a similar behaviour as shown in the figure 7(b). As measured before in our group, the electron temperature in the expanding Ar plasma is higher for smaller Ar flow rates [50]. Thus the decomposition of CH 4 is enhanced when the Ar flow is small.…”

Section: Influence Of the Ar Flowsupporting

confidence: 79%

a-C:H/a-C:H(N) thin film deposition using 2.45 GHz expanding surface wave sustained plasmas

Hong¹,

Douai²,

Berndt³

et al. 2005

Plasma Sources Sci. Technol.

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Thin film properties such as homogeneity (radial profiles), optical constants, carbon density in the film, and the surface structures are strongly dependent on deposition conditions. We have investigated a-C:H/a-C:H(N) thin film deposition by expanding Ar-CH 4 and Ar/N 2 -CH 4 surface wave sustained plasmas at a frequency of 2.45 GHz. The influence of the plasma parameters such as pressure, input power, gas mixture rate, and an external bias voltage on the change of the film properties is systematically studied. An external bias applied to the substrate leads to more dense and harder a-C:H films, i.e. change from soft polymer-like to hard diamond-like. Rutherford backscattering and atomic force microscope surface topology confirm the densification of the films.

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Section: Influence Of the Ar Flowsupporting

confidence: 79%

a-C:H/a-C:H(N) thin film deposition using 2.45 GHz expanding surface wave sustained plasmas

Hong¹,

Douai²,

Berndt³

et al. 2005

Plasma Sources Sci. Technol.

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“…In many instances, however, the addition of only one extra rare gas to Ar-containing plasmas can be useful for sampling different energy regions of the EEDF. Examples of the latter include analysis made with Ar/He [53,84], Ar/Ne [58], Kr/Ar [85] and Xe/Ne [76] line-ratio pairs. We have, in our laboratory, measured the line ratio of the Ne(2p 1 ) level (585.2 nm, ∼19 eV) to the Ar(3p 1 ) level (425.9 nm, 14.74 eV) for a 20% admixture of Ne to a inductively coupled Ar plasma to illustrate the power of this approach (figure 9).…”

Section: Trg Additionmentioning

confidence: 99%

Application of excitation cross sections to optical plasma diagnostics

Boffard

Lin

DeJoseph

2004

J. Phys. D: Appl. Phys.

198

177

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Many optical-based plasma diagnostic techniques require electron-impact excitation cross sections. In recent years, a considerable number of new results have become available for excitation of rare-gas atoms from both the ground state and metastable states. Using relatively simple techniques these cross sections can be combined with plasma emission measurements to extract many useful plasma parameters such as the electron temperature. Many of the limitations of simple plasma emission models such as the corona model can be overcome by using cross section measurements to select what particular emission lines to use in the analysis.

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“…Because of the high pressure gradient between the tube (1 mbar) and the chamber (10 −3 mbar), at the end of the tube the plasma The left graph in Fig. 2.3 presents the intensity ratio of the measured lines in the mixture of He at 677.8 nm and Ar at 677.7 nm at different positions along the discharge starting from the surfatron (z = -37 cm) to the expansion region (z = 0 cm) for three different gas flows (He : Ar = 7.5 : 7.5, 30 : 30 and 60 : 60 sccm) [10]. After applying the corona model, described in [11], the variation of the electron temperature along the discharge can be derived from the intensity ratios of these lines.…”

Section: Introductionmentioning

confidence: 99%