“…The process taking place in all these electromodulation experiments can be described as follows: the internal electric field distribution in the thin film, E ( x ; V AC ) is modified by under application of an alternative potential, V AC , which affects the spatial distribution of the thin film absorption coefficient, α 2 (λ, x ; V AC ). Essentially, the incident light beam undergoes multiple reflections in the thin film, giving rise to an interference phenomenon because of the difference of the refraction index of the thin film (FTO in our case) and the glass substrate. − The ratio of the field-modulated reflectance to the total reflectance, d R / R , is then directly recorded as a function of wavelength. Here we show that the modulation reflection spectrum (d R / R vs λ) of the FTO layer at the back contact of a DSSC can be used in order to evaluate the potential distribution at the FTO/TiO 2 /electrolyte interface and its dependence on the voltage and illumination bias.…”