2003
DOI: 10.1007/s10311-002-0009-0
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Spectroscopic tools for remote sensing of greenhouse gases CH 4 , CF 4 and SF 6

Abstract: Highly symmetrical molecules such as CH 4 , CF 4 or SF 6 are known to be atmospheric pollutants and greenhouse gases. High-resolution spectroscopy in the infrared is particularly suitable for the monitoring of gas concentration and radiative transfers in the earth's atmosphere. This technique requires extensive theoretical studies for the modeling of the spectra of such molecules (positions, intensities and shapes of absorption lines). Here, we have developed powerful tools for the analysis and the simulation … Show more

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Cited by 26 publications
(2 citation statements)
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“…CF4 is a highly absorbing molecule in the infrared range and has one of the largest known global warming potentials (GWP) [6]. Consequently, tetrafluoromethane can play an active role in global climate change and falls under the directives of Kyoto Protocol of the United Nations Framework Convention on Climate Change (UNFCCC) for species recommended for environmental monitoring [2] [3] [7].…”
Section: Introductionmentioning
confidence: 99%
“…CF4 is a highly absorbing molecule in the infrared range and has one of the largest known global warming potentials (GWP) [6]. Consequently, tetrafluoromethane can play an active role in global climate change and falls under the directives of Kyoto Protocol of the United Nations Framework Convention on Climate Change (UNFCCC) for species recommended for environmental monitoring [2] [3] [7].…”
Section: Introductionmentioning
confidence: 99%
“…Infrared high spectral resolution solar occultation spectrometer lead to an abundance of 70.45 ±3.40 ppt [3]. Because of this atmospheric persistence, CF 4 is regulated by the Kyoto Protocol of the United Nations Framework Convention on Climate Change (UNFCCC) [4,5,6] as a substance whose atmospheric concentration should be supervised and reduced. Besides its natural origin [7,8,9], the second source of CF 4 is linked to aluminium production and to the manufacturing of semiconductor [10].…”
Section: Introductionmentioning
confidence: 99%