1999
DOI: 10.1088/0022-3727/32/12/306
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Specular and non-specular x-ray scattering study of SiO2/Si structures

Abstract: In this investigation we apply the x-ray reflectivity and diffuse scattering measurements to study the interface and surface morphology and bulk properties of SiO 2 amorphous films grown on Si substrates. Three samples with different interface and surface roughnesses are analysed. Simultaneous fitting of both specular reflectivity and diffuse scattering curves allows the determination of precise values of surface and interface roughness, film thickness and bulk density of silicon dioxide films. The distorted-w… Show more

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Cited by 8 publications
(6 citation statements)
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“…The correlation length of the SiO 2 surface could not be accurately measured by AFM as it is likely similar to the tip radius. A value of ζ SiO2 = 110 Å has been reported in the literature as measured by nonspecular X-ray scattering and is assumed similar in our case. Figure a,b shows selected AFM topographical images of F 16 CoPc films deposited at room temperature on SiO 2 with thicknesses of 56 and 262 Å, respectively.…”
Section: Resultssupporting
confidence: 58%
“…The correlation length of the SiO 2 surface could not be accurately measured by AFM as it is likely similar to the tip radius. A value of ζ SiO2 = 110 Å has been reported in the literature as measured by nonspecular X-ray scattering and is assumed similar in our case. Figure a,b shows selected AFM topographical images of F 16 CoPc films deposited at room temperature on SiO 2 with thicknesses of 56 and 262 Å, respectively.…”
Section: Resultssupporting
confidence: 58%
“…The thickness of the SAM was measured by X-ray reflectivity . The determined thickness for 1a /Au is 51 Å, indicating the formation of the monolayers (Table ).…”
Section: Resultsmentioning
confidence: 99%
“…The X-ray reflectivity and diffuse scattering measurements were carried out using a high-resolution X-ray diffractometer (Advanced Thin Film X-Ray System ATX-E, Rigaku Corporation) . X-rays with wavelength λ = 1.5405 Å (CuK α 1 ) are generated from a Cu rotating anode (50 kV, 300 mA) and collimated by a parabolic multilayer mirror and monochromator.…”
Section: Methodsmentioning
confidence: 99%
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“…Grazing incidence x-ray reflectometry is a nondestructive technique which provides a powerful method to carry out structural analysis of various materials, [3][4][5][6][7][8][9][10][11][12] but only some studies were related to polymeric materials. [13][14][15] By varying the incidence angle, samples can be probed on thickness going from atomic scale to few micrometers.…”
Section: Introductionmentioning
confidence: 99%