Abstract$$SiO_2$$
S
i
O
2
with the $$\alpha$$
α
-quartz structure is one of the most popular piezoelectrics. It is widely used in crystal oscillators, bulk acoustic wave (BAW) devices, surface acoustic wave (SAW) devices, and so on. $$GeO_2$$
G
e
O
2
can also be crystallized into the $$\alpha$$
α
-quartz structure and it has better piezoelectric properties, with higher piezoelectric coefficient and electromechanical coupling coefficients, than $$SiO_2$$
S
i
O
2
. Experiments on bulk crystals and theoretical studies have shown that these properties can be tuned by varying the Si/Ge ratio in the $$Si_xGe_{1-x}O_2$$
S
i
x
G
e
1
-
x
O
2
solid solution. However, to the best of our knowledge, thin films of $$Si_xGe_{1-x}O_2$$
S
i
x
G
e
1
-
x
O
2
quartz have never been reported. Here we present the successful crystallization of $$Si_xGe_{1-x}O_2$$
S
i
x
G
e
1
-
x
O
2
thin films in the $$\alpha$$
α
-quartz phase on quartz substrates ($$SiO_2$$
S
i
O
2
) with x up to 0.75. Generally, the films grow semi-epitaxially, with the same orientation as the substrates. Interestingly, the $$Si_{0.75}Ge_{0.25}O_2$$
S
i
0.75
G
e
0.25
O
2
composition grows fully strained by the quartz substrates and this leads to the formation of circular quartz domains with an ordered Dauphiné twin structure. These studies represent a first step towards the optimization of piezoelectric quartz thin films for high frequency (> 5 GHz) applications.