Spin Coating of a PMMA/Chlorobenzene Solution

Bornside, David E.; Macosko, Chris; Scriven, L. E.

doi:10.1149/1.2085563

Cited by 111 publications

(125 citation statements)

References 15 publications

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“…If the evaporation rate is proportional to the surface concentration and if stratification is absent, then conservation of total volume gives α = kφ 2 (1 − φ) with k a proportionality coefficient that depends on vapor pressure, solvent quality, spin speed, etc. [13]. We note that the kinetics due to evaporation differs from that of a system in which one component is converted into the other by irreversible first order reaction.…”

mentioning

confidence: 89%

“…Phase separation induced by solvent evaporation has been extensively studied, often involving spin coating [7][8][9][10][11][12] as it provides excellent control over evaporation and hence the quench rate [13][14][15]. Experimental and theoretical studies have shown that upon fast evaporation a blend demixes along concentration gradients perpendicular to the substrate or liquid-gas interface, i.e., in a stratified fashion.…”

mentioning

confidence: 99%

“…Here, the coefficient α plausibly depends on the local concentration and hence on time [13]. If the evaporation rate is proportional to the surface concentration and if stratification is absent, then conservation of total volume gives α = kφ 2 (1 − φ) with k a proportionality coefficient that depends on vapor pressure, solvent quality, spin speed, etc.…”

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confidence: 99%

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Structuring of polymer solutions upon solvent evaporation

2015

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Structuring of polymer solutions upon solvent evaporation

2015

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“…Evaporation can be described by mass-transfer coeffi cients as shown by Bornside et al [ 19 ] The thinning rate caused by solvent evaporation is given by:…”

Section: Spin Coating Modelmentioning

confidence: 99%

“…The constant c is taken from Bornside et al [ 19 ] The binary diffusion coeffi cient of the solvent in the overlying gas is denoted as D g and the kinematic viscosity of the overlying gas as v g . Finally, R is the ideal gas constant and T the temperature.…”

Section: Spin Coating Modelmentioning

confidence: 99%

Controlling the Dominant Length Scale of Liquid–Liquid Phase Separation in Spin‐coated Organic Semiconductor Films

Franeker

Westhoff

Turbiez

et al. 2014

Adv Funct Materials

129

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Organic electronic devices are often made by solution processing a multi‐component ink. During solution processing, for example, via spin coating, the solvent evaporates and the solid components deposit on the substrate. The morphology of this layer can range from well‐mixed to extensively phase separated. To optimize device performance, it is essential to control the degree and dominant length scale of phase separation. Currently, the mechanism of phase separation induced by solvent evaporation is poorly understood. It has been shown that length scales are influenced by spin speed, drying time, final layer thickness and the ratio between the solid components, but a complete experimental dataset and consistent theoretical understanding are lacking. In this contribution, in situ measurements during spin coating and a simple numerical model are used to understand the drying process. In addition, an advanced image analysis of transmission electron micrographs of films processed under a wide range of processing conditions is carried out. A normalized drying rate is proposed as the key parameter that controls the dominant length scale of phase separation.

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Thin Film Deposition Techniques

Grosso

Boissière

Faustini

2015

The Sol‐Gel Handbook

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International audienceThis chapter focuses on chemical liquid deposition methods that involve controlled covering of surfaces with a chemical liquid solution, the sol-gel solution, of known composition. The techniques include dip coating, spin coating, roll-to-roll coating, droplet-assisted deposition and electro-assisted deposition. The chapter presents briefly the different steps involved in the process of thin film formation that are common to all techniques. To have a better understanding, all available liquid deposition techniques are usually described with an identical sequence of successive steps: initial chemical solution formulation, solution spreading on the surface of the substrate, evaporation of the liquid solution layer, layer post-processing, and final treatment of the layer for stabilization. These steps can be addressed individually because they are separated in time. Important progress made in the past few decades highlights the importance of the evaporation conditions in controlling the structure of the coating, which is better achieved in dip coating

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Spin Coating of a PMMA/Chlorobenzene Solution

Cited by 111 publications

References 15 publications

Structuring of polymer solutions upon solvent evaporation

Structuring of polymer solutions upon solvent evaporation

Controlling the Dominant Length Scale of Liquid–Liquid Phase Separation in Spin‐coated Organic Semiconductor Films

Thin Film Deposition Techniques

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