2007
DOI: 10.1007/s10948-007-0237-4
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Spin Dynamics in Narrow-Gap Semiconductor Epitaxial Layers

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Cited by 11 publications
(11 citation statements)
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“…Based on our experimental results, we suggest that the different temperature behavior arises from the different residual strain within the samples. Similar phenomena have been observed in some III/V materials [9]. It is also observed that the electron spin relaxation time is dependent on material quality for both (111) and (100) CdTe.…”
Section: Contributedsupporting
confidence: 84%
See 1 more Smart Citation
“…Based on our experimental results, we suggest that the different temperature behavior arises from the different residual strain within the samples. Similar phenomena have been observed in some III/V materials [9]. It is also observed that the electron spin relaxation time is dependent on material quality for both (111) and (100) CdTe.…”
Section: Contributedsupporting
confidence: 84%
“…The data shows that within each group of samples T s increases with decreasing FWHM for both (111) and (100) CdTe. Others have proposed that the temperature dependence of T s is reduced by the defect-related structural and electronic environment of localized carriers [9]. However, we believe that the dominant contribution results from the strain rather than the defect density, since the higher structural quality sample B3 (presumably with a lower defect density) exhibits a temperature independent behaviour while the lower structural quality sample A3 exhibits a pronounced temperature dependence.…”
Section: Contributedmentioning
confidence: 71%
“…Let us start with the temperature dependence of spin lifetime. Spin lifetime was measured as function of temperature in GaAs [4,371,520,543], GaSb [544], GaN [545][546][547][548], InAs [549][550][551][552], InSb [551,553], InP [554], ZnSe [555], ZnO [556], CdTe [524] and HgCdTe [557,558]. It was found to decrease with increasing temperature at high temperature (nondegenerate regime) in all these works (e.g., see Fig.…”
Section: Electron Spin Relaxation In N-type Bulk Iii-v and Ii-vi Semimentioning
confidence: 89%
“…It was measured in GaAs [543,573], with τ s in the range of 15-110 ps, in InAs [552,574,575], with τ s in the range of 2-24 ps and in InSb [551,553,558], with τ s in the range of 2-300 ps, depending on the doping density.…”
Section: Electron Spin Relaxation In N-type Bulk Iii-v and Ii-vi Semimentioning
confidence: 99%
“…Recent advances in InSb/ InAlSb QW field effect transistors 9 ͑FETs͒ make this system attractive for developing hybrid spintronic technology. Recent studies on spin lifetime in InSb epitaxial layers, as well as in wide InSb QW structures, 10 suggest that InSb could be more attractive over InAs based devices for spintronic applications. 11 Room temperature Schottky barrier transport in InSb/ InAlSb QW FETs has been reported, where results show good agreement with standard thermionic emission ͑TE͒ theory, confirming the presence of a Schottky barrier.…”
Section: Introductionmentioning
confidence: 99%