We demonstrate electrical injection and detection of spin-polarized electrons in silicon (Si) using epitaxially grown Fe3Si/Si Schottky-tunnel-barrier contacts. By an insertion of a δ-doped n + -Si layer (∼ 10 19 cm −3 ) near the interface between a ferromagnetic Fe3Si contact and a Si channel (∼ 10 15 cm −3 ), we achieve a marked enhancement in the tunnel conductance for reverse-bias characteristics of the Fe3Si/Si Schottky diodes. Using laterally fabricated four-probe geometries with the modified Fe3Si/Si contacts, we detect nonlocal output signals which originate from the spin accumulation in a Si channel at low temperatures.
PACS numbers:To solve critical issues caused by the scaling limit of complementary metal-oxide-semiconductor (CMOS) technologies, spin-based electronics (spintronics) has been studied.[1] For semiconductor spintronic applications, an electrical spin injection from a ferromagnet (FM) into a semiconductor (SC) and its detection are crucial techniques.Recently, methods for spin injection and/or detection in silicon (Si) were explored intensely [2,3,4,5,6,7] because Si has a long spin relaxation time and is compatible with the current industrial semiconductor technologies. Although electrical detections of spin transport in Si conduction channels were demonstrated by two research groups, [4,5] an insulating Al 2 O 3 tunnel barrier between FM and Si was utilized for efficient spin injection and/or detection. To realize gate-tunable spin devices, e.g., spin metal-oxidesemiconductor field effect transistors (spin MOSFET), [8] demonstrations of electrical spin injection and detection in Si conduction channels using Schottky tunnel-barrier contacts will become considerably important. [9,10] By low-temperature molecular beam epitaxy (LTMBE), we recently demonstrated highly epitaxial growth of a binary Heusler alloy Fe 3 Si on Si and obtained an atomically abrupt heterointerface. [11] In this letter, inserting a heavily doped n + -Si layer near the abrupt interface between Fe 3 Si and n-Si, we achieve an effective Shottky tunnel barrier for spin injection into Si. Using nonlocal signal measurements, we demonstrate electrical injection and detection of spin-polarized electrons in Si conduction channels though the Schottky-tunnel-barrier contacts.The n + -Si layer was formed on n-Si(111) (n ∼ 4.5 × 10 15 cm −3 ) by a combination of the Si solid-phase epitaxy with an Sb δ-doping process, [12] where the carrier * E-mail: hamaya@ed.kyushu-u.ac.jp † E-mail: miyao@ed.kyushu-u.ac.jp concentration of the n + -Si layer was ∼ 2.3 × 10 19 cm −3 , determined by Hall effect measurements, and ∼ 10-nmthick non-doped Si layer was grown on the Sb δ-doped layer. Ferromagnetic Fe 3 Si layers with a thickness of ∼ 50 nm were grown by LTMBE at 130 • C, as shown in our previous work.[11] The interface between Fe 3 Si and n + -Si was comparable to that shown in Ref. 11. To evaluate electrical properties of the Fe 3 Si/Si Schottky contacts, we firstly fabricated two different Schottky diodes (∼ 1 mm in diameter) with and w...