2019
DOI: 10.3390/app9183823
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Spin Qubits Confined to a Silicon Nano-Ridge

Abstract: Electrostatically-defined quantum dots (QDs) in silicon are an attractive platform for quantum computation. Localized single electron spins define qubits and provide excellent manipulation and read-out fidelities. We propose a scalable silicon-based qubit device that can be fabricated by industry-compatible processes. The device consists of a dense array of QDs localized along an etched silicon nano-ridge. Due to its lateral confinement, a simple dense array of metallic top-gates forms an array of QDs with con… Show more

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Cited by 5 publications
(3 citation statements)
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References 57 publications
(81 reference statements)
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“…In this model having a total size of 2600 nm by 400 nm, we randomly distribute uncorrelated singly charged defects at the planar Si/SiO 2 interface having a density of 5 × 10 10 cm −2 . This is a typical defect density for Si/SiO 2 interface extracted from room-temperature C-V measurements [85][86][87].…”
Section: Optimization Of Gate-design For Conveyor Belt Mode Shuttlingmentioning
confidence: 99%
“…In this model having a total size of 2600 nm by 400 nm, we randomly distribute uncorrelated singly charged defects at the planar Si/SiO 2 interface having a density of 5 × 10 10 cm −2 . This is a typical defect density for Si/SiO 2 interface extracted from room-temperature C-V measurements [85][86][87].…”
Section: Optimization Of Gate-design For Conveyor Belt Mode Shuttlingmentioning
confidence: 99%
“…An ion implantation process was carried out with a dose of 5 × 10 15 atoms/cm 2 , implantation energy of 8 keV, and a 7 • tilt to form the drain and source regions. A combination of dry oxidation and silicon oxide deposition by high-quality plasma-enhanced chemical vapor deposition (PECVD) was used for the passivation of the drain and source feed lines [42]. The passivation was then etched away on the gate area and the drain and source contact area.…”
Section: Sinw-fet Fabricationmentioning
confidence: 99%
“…Semiconductor quantum computers require scalable QD qubits to be accurately located in close proximity to each other and also be independently addressable by external electrodes via tunable coupling. To date, advances in Si-based qubit technology have been demonstrated mostly using lithographically-defined approaches including electrostatically-induced QDs and physically-etched QDs based on two-dimensional electron-gas (2DEG) or hole-gas (2DHG) heterostructures [ 8 , 9 , 10 , 11 , 12 , 13 , 14 , 15 , 16 , 17 ] and one-dimensional nanowire structures [ 18 , 19 ]. Among the demonstrated electrostatically-induced QD techniques, overlapping gate architectures [ 8 , 20 ] have offered some flexibility in forming gate-controlled QDs with electrically-tunable coupling between adjacent QDs.…”
Section: Introductionmentioning
confidence: 99%