2016
DOI: 10.1155/2016/9746156
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Spin Speed and Duration Dependence of TiO2Thin Films pH Sensing Behavior

Abstract: Titanium dioxide (TiO2) thin films were applied as the sensing membrane of an extended-gate field-effect transistor (EGFET) pH sensor. TiO2thin films were deposited by spin coating method and the influences of the spin speed and spin duration on the pH sensing behavior of TiO2thin films were investigated. The spin coated TiO2thin films were connected to commercial metal-oxide-semiconductor field-effect transistor (MOSFET) to form the extended gates and the MOSFET was integrated in a readout interfacing circuit… Show more

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Cited by 13 publications
(5 citation statements)
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“…decreases the grain size and thickness of the thin films [30]. In addition, the thickness of the n-TiO2/ZnO bilayer thin film was obtained as 262, 240, and 233 nm, which corresponded to spinning speeds of 1000, 2000, and 3000 rpm, respectively.…”
Section: Morphological Properties Of N-tio 2 /Zno Bilayer Thin Filmmentioning
confidence: 86%
See 1 more Smart Citation
“…decreases the grain size and thickness of the thin films [30]. In addition, the thickness of the n-TiO2/ZnO bilayer thin film was obtained as 262, 240, and 233 nm, which corresponded to spinning speeds of 1000, 2000, and 3000 rpm, respectively.…”
Section: Morphological Properties Of N-tio 2 /Zno Bilayer Thin Filmmentioning
confidence: 86%
“…This condition corresponds with a previous study by M. Zulkefle et al, which stated that higher spin speeds generated a higher centrifugal force in the ZnO solution, resulting in more ZnO particles being thrown away. The reduction in the number of ZnO particles subsequently decreases the grain size and thickness of the thin films [30]. In addition, the thickness of the n-TiO 2 /ZnO bilayer thin film was obtained as 262, 240, and 233 nm, which corresponded to spinning speeds of 1000, 2000, and 3000 rpm, respectively.…”
Section: Morphological Properties Of N-tio 2 /Zno Bilayer Thin Filmmentioning
confidence: 94%
“…In general, each of these techniques has a unique set of benefits and drawbacks, and the use of methodology is completely applicationdependent. However, all of these deposition techniques are suitable for depositing thin films with precise control over the film-growth process parameters that allow fine tuning of film thickness, composition, and microstructure according to application specifications, including surface modification of thin films [34][35][36][37][38][39][40][41][42][43][44][45]. Therefore, vacuum-based coating equipment is used in laboratories for cutting-edge experiments and investigations as the coating industries are demanding techniques with new working principles, and highly efficient material synthesis with more precise film quality control for the advancement of modern science and development.…”
Section: Pvd Techniques Advantages and Limitationsmentioning
confidence: 99%
“…The precursor was spin-coated using a two-step spin-coating process by a Laurell WS-650NZ-23NPP/LITE spin coater (Laurell Technologies, Lansdale, PA, USA). In the first step, a rotation speed of 2000 rotations per minute (rpm) was applied for 20 s, followed by the second step with a rotation speed of 3000 rpm for 10 s to obtain uniform spin-coated films [89,90]. For individual sample preparation, 70 µL of a precursor solution was first dropped onto the substrate to ensure that the substrates were fully covered before starting the spin coating.…”
Section: Sample Preparationmentioning
confidence: 99%