“…[ 11 ] However, its low remnant polarization intensity and high annealing temperature have restricted its further development. [ 12 ] In order to improve the remanent polarization intensity of Hf‐based ferroelectric materials, researchers generally insert an interface layer between the electrode and the ferroelectric layer, such as TiO 2 , [ 13,14 ] Al 2 O 3 , [ 15,16,17 ] HfO 2 , [ 18 ] ZrO 2 , [ 19,20 ] La 2 O 3 , [ 21 ] CeO x , [ 22 ] etc. Among them, there are reported works on the performance improvement of ZrO 2 layer in memory [ 23–25 ] and ZrO 2 has good lattice matching effect with HfO 2 , which was suitable as insert layer for improving performances of Hf‐based devices.…”