Dropwise
condensation is favorable for numerous industrial and
heat/mass transfer applications due to the enhanced heat transfer
performance that results from efficient condensate removal. Organofunctional
silane self-assembled monolayer (SAM) coatings are one of the most
common ultrathin low surface energy materials used to promote dropwise
condensation of water vapors because of their minimal thermal resistance
and scalable synthesis process. These SAM coatings typically degrade
(i.e., condensation transitions from the efficient dropwise mode to
the inefficient filmwise mode) rapidly during water vapor condensation.
More importantly, the condensation-mediated coating degradation/failure
mechanism(s) remain unknown and/or unproven. In this work, we develop
a mechanistic understanding of water vapor condensation-mediated organofunctional
silane SAM coating degradation and validate our hypothesis through
controlled coating synthesis procedures on silicon/silicon dioxide
substrates. We further demonstrate that a pristine organofunctional
silane SAM coating resulting from a water/moisture-free coating environment
exhibits superior long-term robustness during water vapor condensation.
Our molecular/nanoscale surface characterizations, pre- and post-condensation
heat transfer testing, indicate that the presence of moisture in the
coating environment leads to uncoated regions of the substrate that
act as nucleation sites for coating degradation. By elucidating the
reasons for formation of these degradation nuclei and demonstrating
a method to suppress such defects, this study provides new insight
into why low surface energy silane SAM coatings degrade during water
vapor condensation. The proposed approach addresses a key bottleneck
(i.e., coating failure) preventing the adoption of efficient dropwise
condensation methods in industry, and it will facilitate enhanced
phase-change heat transfer technologies in industrial applications.