Split-ball resonator as a three-dimensional analogue of planar split-rings

Кузнецов, А. И.; Miroshnichenko, Andrey E.; Fu, Yuan Hsing; Viswanathan, Vignesh; Rahmani, Mohsen; Valuckas, Vytautas; Pan, Zhen Ying; Kivshar, Yuri S.; Pickard, D. S.; Luk’yanchuk, Boris

doi:10.1038/ncomms4104

Cited by 53 publications

(42 citation statements)

References 56 publications

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“…U-shape SRRs have been popular and widely accepted as building blocks for various 2D and 3D MMs 3,14,19,[36][37][38][39] . Conventionally, the resonances of an SRR can be excited by incident light with the electric field (E) polarized parallel to the U-plane (for instance, along the x-direction as shown in Figure 3a) or, alternatively, with the magnetic field perpendicular to the U-plane 36,40 .…”

Section: Unusual Fano Resonances Of Mh-vsrr Arraysmentioning

confidence: 99%

Directly patterned substrate-free plasmonic “nanograter” structures with unusual Fano resonances

et al. 2015

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The application of three-dimensional (3D) plasmonic nanostructures as metamaterials (MMs), nano-antennas, and other devices faces challenges in producing metallic nanostructures with easily definable orientations, sophisticated shapes, and smooth surfaces that are operational in the optical regime and beyond. Here, we demonstrate that complex 3D nanostructures can be readily achieved with focused-ion-beam irradiation-induced folding and examine the optical characteristics of plasmonic ''nanograter'' structures that are composed of free-standing Au films. These 3D nanostructures exhibit interesting 3D hybridization in current flows and exhibit unusual and well-scalable Fano resonances at wavelengths ranging from 1.6 to 6.4 mm. Upon the introduction of liquids of various refractive indices to the structures, a strong dependence of the Fano resonance is observed, with spectral sensitivities of 1400 nm and 2040 nm per refractive index unit under figures of merit of 35.0 and 12.5, respectively, for low-order and high-order resonance in the near-infrared region. This work indicates the exciting, increasing relevance of similarly constructed 3D free-standing nanostructures in the research and development of photonics and MMs.

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Section: Unusual Fano Resonances Of Mh-vsrr Arraysmentioning

confidence: 99%

Directly patterned substrate-free plasmonic “nanograter” structures with unusual Fano resonances

et al. 2015

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“…In the recent past helium ion microscopy [1] has become a mature technique that is best known for its high resolution imaging capabilities. The latest version of these devices, the Zeiss helium ion microscope (model Orion NanoFab) (used in this work) is able to operate with He as well as with Ne ions and provides high resolution nano-engineering capabilities [2][3][4], that so far are unmatched by any other technique. Using neon in the gas field ion source (GFIS) nano-structuring with 2 nm lateral resolution is possible without any metal (Ga) contamination [5,6].…”

Section: Introductionmentioning

confidence: 99%

Nanometer scale elemental analysis in the helium ion microscope using time of flight spectrometry

et al. 2016

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Time of flight backscattering spectrometry (ToF-BS) was successfully implemented in a helium ion microscope (HIM). Its integration introduces the ability to perform laterally resolved elemental analysis as well as elemental depth profiling on the nm scale. A lateral resolution of ≤54nm and a time resolution of Δt≤17ns(Δt/t≤5.4%) are achieved. By using the energy of the backscattered particles for contrast generation, we introduce a new imaging method to the HIM allowing direct elemental mapping as well as local spectrometry. In addition laterally resolved time of flight secondary ion mass spectrometry (ToF-SIMS) can be performed with the same setup. Time of flight is implemented by pulsing the primary ion beam. This is achieved in a cost effective and minimal invasive way that does not influence the high resolution capabilities of the microscope when operating in standard secondary electron (SE) imaging mode. This technique can thus be easily adapted to existing devices. The particular implementation of ToF-BS and ToF-SIMS techniques are described, results are presented and advantages, difficulties and limitations of this new techniques are discussed.

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“…Photolithography and electron beam lithography (EBL) are major fabrication approaches when pattern sizes shrink from micro-to nano-scale. Depending on very low and current focused He ion beam tools, are more suitable for high resolution imaging rather than large area nanopatterning, a record high resolution ̴ 3.5 nm and aspect ratio ̴ 8 ion milling examples were shown with He + [17,18]. In He FIB systems the ions are pulled by a high tension voltage from a 3-atom-sharp metal tip and have a superb axial directionality.…”

Section: Introductionmentioning

confidence: 99%

Nano-proximity direct ion beam writing

Seniutinas

Gervinskas

Anguita³

et al. 2016

Nanofabrication

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Nanofabrication 2015; 2: 54-62 the required resolution and footprint of structures these two techniques can be complemented making pattern over-lays [1]. However, both EBL and photolithography have limitations due to several processing steps of resist exposure, etching, metallization required to make a final device. These limitations were overcome with an emergence of focused ion beam lithography (IBL) which enables direct 3D writing. Even though focused ion beam (FIB) milling technology was first demonstrated in the mid-1970s [2,3], it is still mainly used for sample slicing and lamella preparation for transmission electron microscopy.Among several reasons, lack of stable ion sources has hindered FIB applications in high resolution large scale fabrication, especially where He ion sources are implemented. Nonetheless novel ion sources and column geometries providing high temporal beam stability have been developed over the last decade and opened new avenues for the direct writing at the nanoscale. Stateof-the-art ion beam lithography tools are capable of patterning relatively large areas with cross sections of 100 × 100 μm 2 in tens of minutes [4] depending on complexity and are comparable in speed with mature EBL which is producing 22-nm node lithography masks for the latest microelectronics industry at a throughput ̴ 5 × 10 5 μm 2 h -1 [5]. High precision direct IBL writing found its way in application fields of photonic crystals [6], single molecule sensors [7], nanopores for DNA probing [8,9] to mention a few. Recent development of new Au, Si, Ge ion sources allows not only milling but also a controlled implantation useful for other nanoscale etching and material growth techniques [10][11][12].In plasmonics and nano-photonics, IBL is often used for fabrication/reshaping of nanoscale antennas for the light field confinement and enhancement [13,14] as well as for milling metasurfaces into metal layers [15,16]. Material properties are altered by projectile ion implantation (usually Ga + ) around the cuts and this dampens plasmonic or optical resonances of the fabricated structures. With Abstract: Focused ion beam (FIB) milling with a 10 nm resolution is used to directly write metallic metasurfaces and micro-optical elements capable to create structured light fields. Surface density of fabricated nano-features, their edge steepness as well as ion implantation extension around the cut line depend on the ion beam intensity profile. The FIB beam intensity cross section was evaluated using atomic force microscopy (AFM) scans of milled line arrays on a thin Pt film. Approximation of two Gaussian intensity distributions describes the actual beam profile composed of central high intensity part and peripheral wings. FIB fabrication reaching aspect ratio of 10 in gold film is demonstrated.

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Split-ball resonator as a three-dimensional analogue of planar split-rings

Cited by 53 publications

References 56 publications

Directly patterned substrate-free plasmonic “nanograter” structures with unusual Fano resonances

Directly patterned substrate-free plasmonic “nanograter” structures with unusual Fano resonances

Nanometer scale elemental analysis in the helium ion microscope using time of flight spectrometry

Nano-proximity direct ion beam writing

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