Spontaneous Formation of Vertical Magnetic‐Metal‐Nanorod Arrays During Plasma‐Enhanced Atomic Layer Deposition

Lee, Han‐Bo‐Ram; Gu, Gang Hee; Son, Jong Yeog; Park, Chan Gyung

doi:10.1002/smll.200801074

Cited by 37 publications

(16 citation statements)

References 34 publications

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“…Further information on chamber configuration can be found in our previous report [6]. Co(iPr-AMD) 2 and Ni(dmamb) 2 were contained in stainless steel and glass bubblers, respectively.…”

Section: Methodsmentioning

confidence: 99%

Cobalt and nickel atomic layer depositions for contact applications

Lee

Kim

Park

et al. 2009

2009 IEEE International Interconnect Technology Conference

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Novel NH 3 -based Co thermal atomic layer deposition (T-ALD) process using Co(iPr-AMD) 2 (bis(N,N′-diisopropylacetamidinato)cobalt(II)) and NH 3 as a precursor and a reactant, respectively, was developed for nanoscale contact applications. The T-ALD Co films showed high purity with perfect conformality inside nanosize contact holes. By annealing the T-ALD Co films, CoSi 2 was obtained. Similarly, Ni T-ALD process using NH 3 as a reactant was also investigated by using Ni(dmamb) 2 (bis(dimethylamino-2-methyl-2-butoxo)nickel) and Ni films showed perfect conformality of T-ALD Ni.

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“…Further information on chamber configuration can be found in our previous report [6]. Co(iPr-AMD) 2 and Ni(dmamb) 2 were contained in stainless steel and glass bubblers, respectively.…”

Section: Methodsmentioning

confidence: 99%

Cobalt and nickel atomic layer depositions for contact applications

Lee

Kim

Park

et al. 2009

2009 IEEE International Interconnect Technology Conference

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“…The precise control of the thickness of the ALD layers combined to the high step coverage permitted to introduce new approaches for nanostructure fabrication 13–26. For instance, using nanopaterning by area selective ALD,27 porous28 and nanostructured templates,29 novel nanostructured materials can be elaborated by ALD.…”

Section: Nanostructure Fabricationmentioning

confidence: 99%

Synergetic Effects of Al³⁺ Doping and Graphene Modification on the Electrochemical Performance of V₂O₅ Cathode Materials

et al. 2015

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A series of V2O5-based cathode materials that include V2O5 and Al0.14 V2O5 nanoparticles, V2O5/reduced graphene oxide (RGO), and Al0.16 V2O5/RGO nanocomposites are prepared by a simple soft chemical method. XRD and Raman scattering show that the Al ions reside in the interlayer space of the materials. These doping ions strengthen the V−O bonds of the [VO5] unit and enhance the linkage of the [VO5] layers, which thus increases the structural stability of V2O5. SEM and TEM images show that the V2O5 nanoparticles construct a hybrid structure with RGO that enables fast electron transport in the electrode matrix. The electrochemical properties of the materials are studied by charge-discharge cycling, cyclic voltammetry, and electrochemical impedance spectroscopy. Of all the materials tested, the one that contained both Al ions and RGO (Al0.16 V2O5/RGO) exhibited the highest discharge capacity, the best rate capability, and excellent capacity retention. The superior electrochemical performance is attributed to the synergetic effects of Al(3+) doping and RGO modification, which not only increase the structural stability of the V2O5 lattice but also improve the electrochemical kinetics of the material.

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“…In particular, ALD is a precise technique for the decoration of the passivation layer with preferable advantages including controlled interface, remarkable uniformity, and efficient thickness control. Currently, a large number of materials are being prepared through the ALD process such as dielectric absorbers (ZnO, Al 2 O 3 , ZrO 2 ), and magnetic absorbers (Ni, Fe 3 O 4 , NiFe 2 O 4 ) [30][31][32][33]. It is considered an accurate technology to design dielectric/ magnetic composites with outstanding microwave absorption performances by adjusting the permittivity and permeability.…”

Section: Introductionmentioning

confidence: 99%

Atomic-Scale Layer-by-Layer Deposition of FeSiAl@ZnO@Al2O3 Hybrid with Threshold Anti-Corrosion and Ultra-High Microwave Absorption Properties in Low-Frequency Bands

et al. 2021

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Developing highly efficient magnetic microwave absorbers (MAs) is crucial, and yet challenging for anti-corrosion properties in extremely humid and salt-induced foggy environments. Herein, a dual-oxide shell of ZnO/Al2O3 as a robust barrier to FeSiAl core is introduced to mitigate corrosion resistance. The FeSiAl@ZnO@Al2O3 layer by layer hybrid structure is realized with atomic-scale precision through the atomic layer deposition technique. Owing to the unique hybrid structure, the FeSiAl@ZnO@Al2O3 exhibits record-high microwave absorbing performance in low-frequency bands covering L and S bands with a minimum reflection loss (RLmin) of -50.6 dB at 3.4 GHz. Compared with pure FeSiAl (RLmin of -13.5 dB, a bandwidth of 0.5 GHz), the RLmin value and effective bandwidth of this designed novel absorber increased up to ~ 3.7 and ~ 3 times, respectively. Furthermore, the inert ceramic dual-shells have improved 9.0 times the anti-corrosion property of FeSiAl core by multistage barriers towards corrosive medium and obstruction of the electric circuit. This is attributed to the large charge transfer resistance, increased impedance modulus |Z|0.01 Hz, and frequency time constant of FeSiAl@ZnO@Al2O3. The research demonstrates a promising platform toward the design of next-generation MAs with improved anti-corrosion properties.

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Spontaneous Formation of Vertical Magnetic‐Metal‐Nanorod Arrays During Plasma‐Enhanced Atomic Layer Deposition

Cited by 37 publications

References 34 publications

Cobalt and nickel atomic layer depositions for contact applications

Cobalt and nickel atomic layer depositions for contact applications

Synergetic Effects of Al³⁺ Doping and Graphene Modification on the Electrochemical Performance of V₂O₅ Cathode Materials

Atomic-Scale Layer-by-Layer Deposition of FeSiAl@ZnO@Al2O3 Hybrid with Threshold Anti-Corrosion and Ultra-High Microwave Absorption Properties in Low-Frequency Bands

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Spontaneous Formation of Vertical Magnetic‐Metal‐Nanorod Arrays During Plasma‐Enhanced Atomic Layer Deposition

Cited by 37 publications

References 34 publications

Cobalt and nickel atomic layer depositions for contact applications

Cobalt and nickel atomic layer depositions for contact applications

Synergetic Effects of Al3+ Doping and Graphene Modification on the Electrochemical Performance of V2O5 Cathode Materials

Atomic-Scale Layer-by-Layer Deposition of FeSiAl@ZnO@Al2O3 Hybrid with Threshold Anti-Corrosion and Ultra-High Microwave Absorption Properties in Low-Frequency Bands

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About

Synergetic Effects of Al³⁺ Doping and Graphene Modification on the Electrochemical Performance of V₂O₅ Cathode Materials